Excellent electrical and reliability characteristics of 11Å oxynitride gate dielectrics by remote plasma nitridation treatment

2006 ◽  
Vol 88 (11) ◽  
pp. 112904 ◽  
Author(s):  
Tung-Ming Pan
Keyword(s):  
Gate Dielectrics ◽  
Remote Plasma ◽  
Plasma Nitridation ◽  
Reliability Characteristics

Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

2010 ◽  
Vol 257 (4) ◽  
pp. 1347-1350 ◽  
Author(s):  
K.-S. Park ◽  
K.-H. Baek ◽  
D.P. Kim ◽  
J.-C. Woo ◽  
L.-M. Do ◽  
...  
Keyword(s):  
Gate Dielectrics ◽  
Electrical Characteristics ◽  
Remote Plasma ◽  
Plasma Nitridation

High-quality ultrathin (1.6 nm) nitride/oxide stack gate dielectrics prepared by combining remote plasma nitridation and LPCVD technologies

2001 ◽  
Vol 22 (6) ◽  
pp. 260-262 ◽  
Author(s):  
C.H. Chen ◽  
Y.K. Fang ◽  
C.W. Yang ◽  
S.F. Ting ◽  
Y.S. Tsair ◽  
...  
Keyword(s):  
Gate Dielectrics ◽  
Remote Plasma ◽  
High Quality ◽  
Plasma Nitridation ◽  
Nitride Oxide

Modeling and Optimization of Oxynitride Gate Dielectrics Formation by Remote Plasma Nitridation of Silicon Dioxide

1999 ◽  
Vol 146 (3) ◽  
pp. 1111-1116 ◽  
Author(s):  
Dixit Kapila ◽  
Sunil Hattangady ◽  
Monte Douglas ◽  
Robert Kraft ◽  
Michael Gribelyuk
Keyword(s):  
Silicon Dioxide ◽  
Gate Dielectrics ◽  
Remote Plasma ◽  
Modeling And Optimization ◽  
Plasma Nitridation

Comparison of electrical and reliability characteristics of different 14 /spl Aring/ oxynitride gate dielectrics

2002 ◽  
Vol 23 (7) ◽  
pp. 416-418 ◽  
Author(s):  
Tung-Ming Pan ◽  
Hsiu-Shan Lin ◽  
Main-Gwo Chen ◽  
Chuan-Hsi Liu ◽  
Yih-Jau Chang
Keyword(s):  
Gate Dielectrics ◽  
Reliability Characteristics

Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation

2001 ◽  
Vol 78 (24) ◽  
pp. 3875-3877 ◽  
Author(s):  
H. N. Al-Shareef ◽  
A. Karamcheti ◽  
T. Y. Luo ◽  
G. Bersuker ◽  
G. A. Brown ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Device Performance ◽  
Remote Plasma ◽  
Plasma Nitridation

Comparison of electrical characteristics for SiONx and HfZrOx gate dielectrics of MOSFETs with decoupled plasma nitridation treatment

2015 ◽  
Vol 138 ◽  
pp. 97-101 ◽  
Author(s):  
Win-Der Lee ◽  
Mu-Chun Wang ◽  
Shea-Jue Wang ◽  
Wen-How Lan ◽  
Jie-Min Yang ◽  
...  
Keyword(s):  
Gate Dielectrics ◽  
Electrical Characteristics ◽  
Plasma Nitridation
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