Comparison of electrical characteristics for SiONx and HfZrOx gate dielectrics of MOSFETs with decoupled plasma nitridation treatment
2015 ◽
Vol 138
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pp. 97-101
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2010 ◽
Vol 257
(4)
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pp. 1347-1350
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2006 ◽
Vol 24
(4)
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pp. 900-907
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2014 ◽
Vol 598
(1)
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pp. 129-134
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Keyword(s):
2019 ◽
Vol 35
(2)
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pp. 025002
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Keyword(s):
2011 ◽
Vol 257
(9)
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pp. 3964-3968
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2009 ◽
Vol 12
(6)
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pp. G27
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