Electrical characterization of AlxGa1−xAs grown by low‐pressure organometallic vapor phase epitaxy using trimethylamine alane as the aluminum precursor
Electrical Characterization of Ruthenium-Doped InP Grown by Low Pressure Hydride Vapor Phase Epitaxy
2001 ◽
Vol 4
(6)
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pp. G53
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1994 ◽
Vol 23
(2)
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pp. 159-166
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