Parametric modeling and measurement of silicon etching in a high density chlorine plasma

1994 ◽  
Vol 65 (4) ◽  
pp. 478-480 ◽  
Author(s):  
D. Dane ◽  
T. D. Mantei
Keyword(s):  
Parametric Modeling ◽  
High Density ◽  
Silicon Etching

Plasma–wall interactions during silicon etching processes in high-density HBr/Cl2/O2plasmas

2005 ◽  
Vol 14 (2) ◽  
pp. S42-S52 ◽  
Author(s):  
G Cunge ◽  
M Kogelschatz ◽  
O Joubert ◽  
N Sadeghi
Keyword(s):  
High Density ◽  
Silicon Etching ◽  
Wall Interactions

Silicon etching yields in F2, Cl2, Br2, and HBr high density plasmas

2001 ◽  
Vol 19 (5) ◽  
pp. 2197-2206 ◽  
Author(s):  
Steven A. Vitale ◽  
Heeyeop Chae ◽  
Herbert H. Sawin
Keyword(s):  
High Density ◽  
Silicon Etching

Integration and Frequency Dependent Parametric Modeling of Through Silicon via Involved in High Density 3D Chip Stacking

2019 ◽  
Vol 33 (12) ◽  
pp. 1-21 ◽  
Author(s):  
Lionel Cadix ◽  
Christine Fuchs ◽  
Maxime Rousseau ◽  
Patrick Leduc ◽  
Hamed Chaabouni ◽  
...  
Keyword(s):  
Parametric Modeling ◽  
High Density ◽  
Frequency Dependent ◽  
Through Silicon Via ◽  
3D Chip Stacking
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