Delivering high-purity vacuum ultraviolet photons at the Brazilian toroidal grating monochromator (TGM) beamline

2007 ◽  
Vol 156-158 ◽  
pp. 168-171 ◽  
Author(s):  
R.L. Cavasso Filho ◽  
A.F. Lago ◽  
M.G.P. Homem ◽  
S. Pilling ◽  
A. Naves de Brito
Keyword(s):  
High Purity ◽  
Vacuum Ultraviolet ◽  
Grating Monochromator ◽  
Ultraviolet Photons

A synchrotron beamline for delivering high purity vacuum ultraviolet photons

2007 ◽  
Vol 78 (11) ◽  
pp. 115104 ◽  
Author(s):  
R. L. Cavasso Filho ◽  
M. G. P. Homen ◽  
P. T. Fonseca ◽  
A. Naves de Brito
Keyword(s):  
High Purity ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Photons

Low Temperature OMVPE of ZnSe from Alkyl Sources Using a Plasma Disk Lamp

1988 ◽  
Vol 129 ◽  
Author(s):  
K. L. Tokuda ◽  
B. Pihlstrom ◽  
D. W. Kisker ◽  
M. Lamont Schnoes ◽  
G. J. Collins
Keyword(s):  
Growth Process ◽  
Vacuum Ultraviolet ◽  
Source Material ◽  
Organometallic Vapor Phase Epitaxy ◽  
Impurity Incorporation ◽  
High Quality ◽  
Selenium Compound ◽  
Ultraviolet Photons ◽  
Reduced Toxicity ◽  
Source Materials

ABSTRACTThe growth of high quality ZnSe by organometallic vapor phase epitaxy (OMVPE) has generally been hindered because of parasitic source pre-reactions or relatively high source decomposition temperatures. In this work, we have used vacuum ultraviolet photons generated by a disk-plasma lamp to assist the ZnSe growth process using diethylselenium and diethylzinc as source materials. This approach has resulted in satisfactory growth rates and high material quality at temperatures as low as 250°C, without the limitations of prereaction typically observed when H2Se is used for the selenium source material. In addition, the alkyl selenium compound offers advantages due to reduced toxicity compared to H2Se. This new, low-growth-temperature process thus offers the possibility of improved stoichiometry and impurity incorporation control as well as a reduced thermal effect on the underlying substrate during growth. At the same time, the advantages of excellent morphology and uniformity typically exhibited by the alkylbased growth processes are retained.

Untersuchungen zur Wirkung von monochromatischer Vakuum-UV-Strahlung auf DNS

1969 ◽  
Vol 24 (6) ◽  
pp. 722-728 ◽  
Author(s):  
K. U. Berger
Keyword(s):  
Cross Section ◽  
Cross Sections ◽  
Electron Emission ◽  
Vacuum Ultraviolet ◽  
Monochromatic Light ◽  
Ionization Probability ◽  
Thin Layers ◽  
Inactivation Mechanism ◽  
Grating Monochromator ◽  
Vacuum Uv

Inactivation cross sections of infectious ΦΧ-174-DNA in the extreme vacuum-ultraviolet were determined by irradiation of thin layers with monochromatic light down to 584 Å by means of a powerful grating-monochromator, the elements of which are described. Comparison of inactivation and light-induced electron emission shows that light of quantum energies below 7 eV inactivates by excitation only, whereas above 10.2 eV ionization is the predominant inactivation mechanism. Because of the satisfactory agreement of the curves for inactivation and electron emission, it is conducted that the remarkable increase of the inactivation cross section in the region of the short wavelength vacuum-uv is due to increasing ionization probability.

Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing

1997 ◽  
Vol 70 (13) ◽  
pp. 1700-1702 ◽  
Author(s):  
R. Singh ◽  
K. C. Cherukuri ◽  
L. Vedula ◽  
A. Rohatgi ◽  
S. Narayanan
Keyword(s):  
Low Temperature ◽  
Thermal Processing ◽  
Vacuum Ultraviolet ◽  
Rapid Thermal Processing ◽  
Shallow Junction ◽  
Junction Formation ◽  
Ultraviolet Photons

A new extra-focus monochromator designed for high-performance VUV beamlines

2015 ◽  
Vol 22 (2) ◽  
pp. 328-335 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Yong Wang ◽  
...  
Keyword(s):  
High Performance ◽  
Vacuum Ultraviolet ◽  
Wide Energy Range ◽  
X Ray ◽  
Ultraviolet Range ◽  
Line Spacing ◽  
Wide Energy ◽  
Focus Spot ◽  
Grating Monochromator ◽  
Mechanical Compatibility

A new monochromator called an extra-focus constant-included-angle varied-line-spacing (VLS) cylindrical-grating monochromator (extra-focus CIA-VCGM) is described. This monochromator is based on the Hettrick–Underwood scheme where the plane VLS grating is replaced by a cylindrical one in order to zero the defocus at three reference photon energies in the vacuum-ultraviolet range. It has a simple mechanical structure and a fixed focus spot with high performance over a wide energy range. Furthermore, its mechanical compatibility with a standard VLS plane-grating monochromator allows convenient extension into the soft-X-ray range.

Applications of VUV extra-focus mechanism: high-performance dual-mode monochromator from VUV to soft X-ray

2015 ◽  
Vol 22 (6) ◽  
pp. 1353-1358 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Zhi Guo ◽  
...  
Keyword(s):  
High Performance ◽  
Vacuum Ultraviolet ◽  
Normal Incidence ◽  
Resolving Power ◽  
Dual Mode ◽  
Included Angle ◽  
X Ray ◽  
Line Spacing ◽  
Grating Monochromator ◽  
Mode Solution

A new monochromator scheme is presented in which an extra-focus constant-included-angle varied-line-spacing cylindrical-grating monochromator (extra-focus CIA-VCGM) is conveniently combined with a variable-included-angle varied-line-spacing plane-grating monochromator (VIA-VPGM). This dual-mode solution delivers high performance in the energy range from vacuum ultraviolet (VUV) to soft X-ray. The resolving power and the efficiency of this dual-mode grating monochromator are analyzed in detail based on realistic parameters. Comparisons with the commonly used variable-included-angle plane-grating monochromator and normal-incidence monochromator (VIA-PGM/NIM) hybrid monochromator are made.

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