IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)
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Highly selective oxide to nitride etch processes on BPSG/nitride/oxide structures in a MERIE etcher

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731580 ◽

2002 ◽

Cited By ~ 2

Author(s):

W. Graf ◽

D. Basso ◽

F. Gautier ◽

J.M. Martin ◽

E. Sabouret ◽

...

Keyword(s):

Nitride Oxide

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Matching automated CD SEMs in multiple manufacturing environments

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731567 ◽

2002 ◽

Cited By ~ 1

Author(s):

J. Allgair ◽

D. Ruehle ◽

J. Miller ◽

R. Elliot

Keyword(s):

Manufacturing Environments

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In-line defect density targets for new technology from development to manufacturing

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731548 ◽

2002 ◽

Author(s):

E. Shamble ◽

M. Ben-Tzur ◽

S. Sharifzadeh

Keyword(s):

Defect Density ◽

New Technology ◽

Line Defect

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Semiconductor metrics: conflicting goals or increasing opportunities?

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731391 ◽

2002 ◽

Cited By ~ 7

Author(s):

L. Sattler ◽

R. Schlueter

Keyword(s):

Conflicting Goals

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Quantifying capacity loss associated with staffing in a semiconductor manufacturing line

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731470 ◽

2002 ◽

Cited By ~ 4

Author(s):

C. Pollitt ◽

J. Matthews

Keyword(s):

Semiconductor Manufacturing ◽

Capacity Loss ◽

Manufacturing Line

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Better dispatch application-a success story [IC manufacture]

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731632 ◽

2002 ◽

Cited By ~ 4

Author(s):

A. Giegandt ◽

G. Nicholson

Keyword(s):

Success Story

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Development of a production worthy copper CMP process

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731616 ◽

2002 ◽

Cited By ~ 6

Author(s):

K. Wijekoon ◽

S. Mishra ◽

S. Tsai ◽

K. Puntambekar ◽

M. Chandrachood ◽

...

Keyword(s):

Copper Cmp

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Human based knowledge for the probe failure pattern classification with the use of a backpropagation neural network. Application on submicron linear technologies

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731547 ◽

2002 ◽

Cited By ~ 1

Author(s):

C. Ortega ◽

J. Ignacio ◽

A. Montull ◽

E. Sobrino

Keyword(s):

Neural Network ◽

Pattern Classification ◽

Failure Pattern ◽

Backpropagation Neural Network ◽

Network Application

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Predictive yield modeling for reconfigurable memory circuits

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731368 ◽

2002 ◽

Cited By ~ 7

Author(s):

D.J. Ciplickas ◽

X. Li ◽

R. Vallishayee ◽

A. Strojwas ◽

R. Williams ◽

...

Keyword(s):

Yield Modeling ◽

Memory Circuits ◽

Reconfigurable Memory

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Manufacturing and reliability improvements in metal-oxide-metal capacitors-MOMCAPs

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) ◽

10.1109/asmc.1998.731550 ◽

2002 ◽

Cited By ~ 4

Author(s):

L. Lowell

Keyword(s):

Metal Oxide

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IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Highly selective oxide to nitride etch processes on BPSG/nitride/oxide structures in a MERIE etcher

Matching automated CD SEMs in multiple manufacturing environments

In-line defect density targets for new technology from development to manufacturing

Semiconductor metrics: conflicting goals or increasing opportunities?

Quantifying capacity loss associated with staffing in a semiconductor manufacturing line

Better dispatch application-a success story [IC manufacture]

Development of a production worthy copper CMP process

Human based knowledge for the probe failure pattern classification with the use of a backpropagation neural network. Application on submicron linear technologies

Predictive yield modeling for reconfigurable memory circuits

Manufacturing and reliability improvements in metal-oxide-metal capacitors-MOMCAPs

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)
Latest Publications