Preparation of Microcrystalline Silicon with the Layer-by-Layer Technique at Various Plasma Excitation Frequencies

1996 ◽  
Vol 452 ◽  
Author(s):  
P. Hapke ◽  
R. Carius ◽  
F. Finger ◽  
A. Lambertz ◽  
O. Vetterl ◽  
...  
Keyword(s):  
Phase Transformation ◽  
Excitation Frequency ◽  
Hydrogen Treatment ◽  
Layer By Layer ◽  
Microcrystalline Silicon ◽  
Nucleation Layer ◽  
Layer Technique ◽  
Plasma Excitation ◽  
Excitation Frequencies ◽  
Layer By Layer Technique

AbstractFor application as nucleation layer in thin film devices, microcrystalline silicon was deposited with the layer-by-layer technique using plasma excitation frequencies between 27 and 95 MHz, various hydrogen treatment times and various film thicknesses per layer. An optimum phase transformation is found at an intermediate plasma excitation frequency, i.e. at this frequency the shortest hydrogen annealing time is necessary for an effective amorphous-to-crystalline phase transformation.

Highly Textured Microcrystalline Si-Thin film Fabricated by Layer-by-Layer Technique

1992 ◽  
Vol 283 ◽  
Author(s):  
Shun-Ichi Ishihara ◽  
Deyan He ◽  
Tetsuya Akasaka ◽  
Yuzoh Arak ◽  
Masami Nakata ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Hydrogen ◽  
Marked Improvement ◽  
Layer By Layer ◽  
Ordered Structure ◽  
Microcrystalline Silicon ◽  
Layer Technique ◽  
Layer By Layer Technique ◽  
Si Thin Film

ABSTRACTMicrocrystalline silicon with high crystallinity was fabricated on a glass substrate at a rather low temperature (320 C) by alternately repeating the deposition of Si thin layer 10 nm thick from fluorinated precursors and the treatment with atomic hydrogen. Hydrogen content was reduced to 0.5 at% or less. According to the in situ ellipsometric observation, the sticking of precursors followed the reactions for the construction of the ordered structure with the aid of atomic hydrogen. In addition, the defects were passivated efficiently with the treatment down to 4×1016 spins/cm3. A marked improvement was simultaneously verified in the efficiency of the substitutional P-doping in the films fabricated by this layer-by-layer technique.

Growth and Structure of Microcrystalline Silicon Prepared with Glow Discharge at Various Plasma Excitation Frequencies

1996 ◽  
Vol 452 ◽  
Author(s):  
F. Finger ◽  
R. Carius ◽  
P. Hapke ◽  
L. Houben ◽  
M. Luysberg ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Excitation Frequency ◽  
Interface Layer ◽  
Silicon Substrates ◽  
Microcrystalline Silicon ◽  
Porous Interface ◽  
Hydrogen Mixtures ◽  
Plasma Excitation ◽  
Excitation Frequencies ◽  
Quartz Substrates

AbstractMicrocrystalline silicon was prepared with glow discharge deposition from silane/hydrogen mixtures at plasma excitation frequencies in the range 13.56 MHz - 116 MHz. The influence of the plasma excitation frequency on the growth and the structural properties of the material is investigated. At high excitation frequencies, higher growth and etching rates, larger grain sizes with less disorder within the grains, higher crystalline volume fractions, a reduced amorphous but more porous interface layer on glass and quartz substrates, and faster nucleation on amorphous silicon substrates are obtained. The results are discussed within a schematical growth model.

Preparation of High-Quality Microcrystalline Silicon from Fluorinated Precursors by a Layer-by-Layer Technique

1993 ◽  
Vol 32 (Part 1, No. 4) ◽  
pp. 1539-1545 ◽  
Author(s):  
Shun-ichi Ishihara ◽  
Deyan He ◽  
Masami Nakata ◽  
Isamu Shimizu
Keyword(s):  
Layer By Layer ◽  
Microcrystalline Silicon ◽  
High Quality ◽  
Layer Technique ◽  
Layer By Layer Technique

scholarly journals Stable microcrystalline silicon thin-film transistors produced by the layer-by-layer technique

1999 ◽  
Vol 86 (12) ◽  
pp. 7079-7082 ◽  
Author(s):  
P. Roca i Cabarrocas ◽  
R. Brenot ◽  
P. Bulkin ◽  
R. Vanderhaghen ◽  
B. Drévillon ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Layer By Layer ◽  
Microcrystalline Silicon ◽  
Silicon Thin Film ◽  
Layer Technique ◽  
Layer By Layer Technique

Pectin-Chitosan Multilayer Coated Microbeads of Diclofenac Sodium Prepared by Layer-by-Layer Technique

2014 ◽  
Vol 1060 ◽  
pp. 45-49
Author(s):  
Kamonrak Cheewatanakornkool ◽  
Pornsak Sriamornsak
Keyword(s):  
Controlled Release ◽  
Drug Release ◽  
Diclofenac Sodium ◽  
Gastric Fluid ◽  
Layer By Layer ◽  
Release Behavior ◽  
Freeze Dried ◽  
Layer Technique ◽  
Calcium Pectinate ◽  
Layer By Layer Technique

The main objective of this study was to fabricate biopolymer-based microbeads, providing enteric properties and controlled release of diclofenac sodium, using layer-by-layer technique. The calcium pectinate microbeads have been designed and coated with chitosan and pectin multilayers. Drug release was performed in simulate gastric fluid (pH 1.2) for 2 hours, followed by pH 6.8 buffer for 8 hours. The effects of chitosan concentration, number of layer and drying technique on drug release were investigated. The results showed that the calcium pectinate microbeads could be simply prepared by ionotropic gelation and then coated with chitosan and pectin solutions using layer-by-layer procedure. The diameter of the microbeads ranged from 800 to 1000 μm for air-dried samples and from 1 to 2 mm for freeze-dried samples. The freeze-dried microbeads had a rough surface and many pores inside, as observed by SEM. The microbeads coated with 4% chitosan/4% pectin revealed a slower drug release than those coated with 1% chitosan/4% pectin and demonstrated a controlled release pattern. Moreover, different drying techniques and numbers of layer also influenced drug release behavior of the prepared microbeads.

Sign in / Sign up

Export Citation Format

Share Document