Structural and electrical characterization of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system

J. P. Hong; C. O. Kim; T. U. Nahm; C. M. Kim

doi:10.1063/1.372076

Structural and electrical characterization of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system

Journal of Applied Physics ◽

10.1063/1.372076 ◽

2000 ◽

Vol 87 (4) ◽

pp. 1676-1680 ◽

Cited By ~ 8

Author(s):

J. P. Hong ◽

C. O. Kim ◽

T. U. Nahm ◽

C. M. Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Silicon Films ◽

Layer By Layer ◽

Microcrystalline Silicon ◽

Layer Technique ◽

Layer By Layer Technique

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Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation

IEICE Transactions on Electronics ◽

10.1093/ietele/e88-c.4.640 ◽

2005 ◽

Vol E88-C (4) ◽

pp. 640-645 ◽

Cited By ~ 4

Author(s):

H. MURAKAMI

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gate Dielectrics ◽

Electrical Characterization ◽

Chemical Vapor ◽

Layer By Layer ◽

Aluminum Oxynitride ◽

Thermal Nitridation

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Relationship between field emission characteristics and hydrogen content in diamondlike carbon deposited by the layer-by-layer technique using plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589331 ◽

1997 ◽

Vol 15 (2) ◽

pp. 428 ◽

Cited By ~ 10

Author(s):

Kyu Chang Park

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Hydrogen Content ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Characteristics ◽

Layer By Layer ◽

Diamondlike Carbon ◽

Layer Technique ◽

Layer By Layer Technique

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Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation

10.7567/ssdm.2002.b-7-1 ◽

2002 ◽

Cited By ~ 1

Author(s):

Hideki MURAKAMI ◽

Wataru MIZUBAYASHI ◽

Hirokazu YOKOI ◽

Atsushi SUYAMA ◽

Seiichi MIYAZAKI

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gate Dielectrics ◽

Electrical Characterization ◽

Chemical Vapor ◽

Layer By Layer ◽

Aluminum Oxynitride ◽

Thermal Nitridation

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Cited By ~ 40

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00714-0 ◽

2000 ◽

Vol 266-269 ◽

pp. 31-37 ◽

Cited By ~ 162

Author(s):

P Roca i Cabarrocas

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Microcrystalline Silicon

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A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure

Vacuum ◽

10.1016/j.vacuum.2009.01.009 ◽

2009 ◽

Vol 83 (7) ◽

pp. 1023-1030 ◽

Cited By ~ 9

Author(s):

R.I. Badran ◽

F.S. Al-Hazmi ◽

S. Al-Heniti ◽

A.A. Al-Ghamdi ◽

J. Li ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Deposition Technique ◽

Microcrystalline Silicon ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Electrical characterization of Si-doped conductive AlInN films grown nearly lattice-matched to c-plane GaN on sapphire by metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/6.0000284 ◽

2020 ◽

Vol 38 (5) ◽

pp. 052205

Author(s):

Makoto Miyoshi ◽

Taiki Nakabayashi ◽

Mizuki Yamanaka ◽

Takashi Egawa ◽

Tetsuya Takeuchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Si Doped ◽

Lattice Matched ◽

Metalorganic Chemical

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Current induced annealing and electrical characterization of single layer graphene grown by chemical vapor deposition for future interconnects in VLSI circuits

Applied Physics Letters ◽

10.1063/1.4895802 ◽

2014 ◽

Vol 105 (11) ◽

pp. 113513 ◽

Cited By ~ 6

Author(s):

Neetu Prasad ◽

Anita Kumari ◽

P. K. Bhatnagar ◽

P. C. Mathur ◽

C. S. Bhatia

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Single Layer ◽

Chemical Vapor ◽

Vlsi Circuits ◽

Single Layer Graphene ◽

Layer Graphene

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Electrical characterization of Si-donor-related shallow and deep states in InGaAlP alloys grown by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(91)90793-5 ◽

1991 ◽

Vol 115 (1-4) ◽

pp. 498-503 ◽

Cited By ~ 17

Author(s):

Mariko Suzuki ◽

Masayuki Ishikawa ◽

Kazuhiko Itaya ◽

Yukie Nishikawa ◽

Gen-ichi Hatakoshi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Metalorganic Chemical

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