scholarly journals Connection between hydrogen plasma treatment and etching of amorphous phase in the layer-by-layer technique with very high frequency plasma excitation

1999 ◽  
Vol 85 (5) ◽  
pp. 2991-2993 ◽  
Author(s):  
O. Vetterl ◽  
P. Hapke ◽  
L. Houben ◽  
F. Finger ◽  
R. Carius ◽  
...  
Keyword(s):  
High Frequency ◽  
Hydrogen Plasma ◽  
Layer By Layer ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Layer Technique ◽  
Plasma Excitation ◽  
Very High ◽  
Layer By Layer Technique

Development of p-type microcrystalline silicon carbon alloy films by the very high frequency plasma-enhanced chemical vapor deposition technique

2001 ◽  
Vol 16 (7) ◽  
pp. 2130-2135
Author(s):  
Tapati Jana ◽  
Arup Dasgupta ◽  
Swati Ray
Keyword(s):  
Substrate Temperature ◽  
High Frequency ◽  
Excitation Frequency ◽  
Deposition Technique ◽  
Very High Frequency ◽  
Silicon Carbon ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Plasma Excitation ◽  
Very High

We developed p-type μc-silicon carbon alloy thin films by the very high frequency plasma-enhanced chemical vapour deposition technique using a SiH4, H2, CH4, and B2H6 gas mixture at low power (55 mW/cm2) and low substrate temperatures (150–250 °C). Effects of substrate temperature and plasma excitation frequency on the optoelectronic and structural properties of the films were studied. A film with conductivity 5.75 Scm−1 and 1.93 eV optical gap (E04) was obtained at a low substrate temperature of 200 °C using 63.75 MHz plasma frequency. The crystalline volume fractions of the films were estimated from the Raman spectra. We observed that crystallinity in silicon carbon alloy films depends critically on plasma excitation frequency. When higher power (117 mW/cm2) at 180 °C with 66 MHz frequency was applied, the deposition rate of the film increased to 50.7 Å/min without any significant change in optoelectronic properties.

Characteristics of Very High Frequency Plasma Produced Using a Ladder-Shaped Electrode

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4305-4308 ◽  
Author(s):  
Hiroshi Mashima ◽  
Masayoshi Murata ◽  
Yoshiaki Takeuchi ◽  
Hideo Yamakoshi ◽  
Tatsuji Horioka ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
High Frequency Plasma ◽  
Frequency Plasma ◽  
Very High
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