scholarly journals Design of an illumination system for high-numerical-aperture anamorphic extreme ultraviolet projection lithography

2021 ◽  
Author(s):  
Qian Hao ◽  
Xu Yan ◽  
Ke Liu ◽  
Yanqiu Li ◽  
lihui liu ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Illumination System ◽  
Projection Lithography

Tolerance Analysis of High-Numerical Aperture Extreme Ultraviolet Lithographic Objective

2015 ◽  
Vol 52 (12) ◽  
pp. 122207
Author(s):  
孙圆圆 Sun Yuanyuan ◽  
李艳秋 Li Yanqiu ◽  
曹振 Cao Zhen
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Tolerance Analysis ◽  
High Numerical Aperture

Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

2004 ◽  
Vol 22 (6) ◽  
pp. 2975 ◽  
Author(s):  
Tetsuya Oshino ◽  
Shinichi Takahashi ◽  
Takahiro Yamamoto ◽  
Tatsuya Miyoshi ◽  
Masayuki Shiraishi ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Ultraviolet Exposure ◽  
Projection Optics

Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)

2014 ◽  
Author(s):  
Patrick A. Kearney ◽  
Obert Wood ◽  
Eric Hendrickx ◽  
Greg McIntyre ◽  
Soichi Inoue ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

2019 ◽  
Vol 48 (8) ◽  
pp. 814002
Author(s):  
毛姗姗 Mao Shanshan ◽  
李艳秋 Li Yanqiu ◽  
刘 克 Liu Ke ◽  
刘丽辉 Liu Lihui ◽  
郑 猛 Zheng Meng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Optical Design ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Freeform Surfaces ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture
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