Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography

2016 ◽  
Vol 8 (9) ◽  
pp. 729-733 ◽  
Author(s):  
Yong Ju Jang ◽  
Jung Sik Kim ◽  
Seongchul Hong ◽  
Jinho Ahn
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture ◽  
3D Effect ◽  
Phase Shift Mask

Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography

2013 ◽  
Vol 6 (9) ◽  
pp. 096501 ◽  
Author(s):  
Seongchul Hong ◽  
Seejun Jeong ◽  
Jae Uk Lee ◽  
Seung Min Lee ◽  
Jinho Ahn
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

2019 ◽  
Vol 48 (8) ◽  
pp. 814002
Author(s):  
毛姗姗 Mao Shanshan ◽  
李艳秋 Li Yanqiu ◽  
刘 克 Liu Ke ◽  
刘丽辉 Liu Lihui ◽  
郑 猛 Zheng Meng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Optical Design ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Freeform Surfaces ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture
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