Design of a high-numerical-aperture extreme ultraviolet lithography illumination system

2018 ◽  
Vol 57 (20) ◽  
pp. 5673 ◽  
Author(s):  
Jiahua Jiang ◽  
Yanqiu Li ◽  
Shihuan Shen ◽  
Shanshan Mao
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture ◽  
Illumination System

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

2019 ◽  
Vol 48 (8) ◽  
pp. 814002
Author(s):  
毛姗姗 Mao Shanshan ◽  
李艳秋 Li Yanqiu ◽  
刘 克 Liu Ke ◽  
刘丽辉 Liu Lihui ◽  
郑 猛 Zheng Meng ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Optical Design ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Freeform Surfaces ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture
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