Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

2004 ◽  
Vol 22 (6) ◽  
pp. 2975 ◽  
Author(s):  
Tetsuya Oshino ◽  
Shinichi Takahashi ◽  
Takahiro Yamamoto ◽  
Tatsuya Miyoshi ◽  
Masayuki Shiraishi ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Ultraviolet Exposure ◽  
Projection Optics

Tolerance Analysis of High-Numerical Aperture Extreme Ultraviolet Lithographic Objective

2015 ◽  
Vol 52 (12) ◽  
pp. 122207
Author(s):  
孙圆圆 Sun Yuanyuan ◽  
李艳秋 Li Yanqiu ◽  
曹振 Cao Zhen
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Tolerance Analysis ◽  
High Numerical Aperture

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

2004 ◽  
Author(s):  
Tetsuya Oshino ◽  
Takahiro Yamamoto ◽  
Tatsuro Miyoshi ◽  
Masayuki Shiraishi ◽  
Takaharu Komiya ◽  
...  
Keyword(s):  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Tool Set ◽  
Aspherical Mirrors ◽  
Projection Optics
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