PFC-Free Dry Etching Method for Si Using Narrow-Gap VHF Plasma at Subatmospheric Pressure
2010 ◽
Vol 157
(2)
◽
pp. D85
◽
1991 ◽
Vol 30
(Part 2, No. 2B)
◽
pp. L252-L254
◽
2008 ◽
Vol 11
(2)
◽
pp. J15
◽
2000 ◽
Vol 39
(Part 2, No. 3A/B)
◽
pp. L188-L190
◽