Polysilicon Gate Etching in High‐Density Plasmas: Comparison Between Oxide Hard Mask and Resist Mask

1997 ◽  
Vol 144 (5) ◽  
pp. 1854-1861 ◽  
Author(s):  
O. Joubert ◽  
F. H. Bell
Keyword(s):  
High Density ◽  
Hard Mask ◽  
Polysilicon Gate

Dry Etching of Nanosized Ge1Sb2Te4 Patterns Using TiN Hard Mask for High Density Phase-Change Memory

2009 ◽  
Vol 9 (2) ◽  
pp. 1526-1529 ◽  
Author(s):  
Gaoming Feng ◽  
Bo Liu ◽  
Zhitang Song ◽  
Shilong Lv ◽  
Liangcai Wu ◽  
...  
Keyword(s):  
Phase Change ◽  
Phase Change Memory ◽  
Dry Etching ◽  
High Density ◽  
Hard Mask ◽  
Change Memory

Electroless Deposited Nickel Hard Mask for High Density Plasma Etching Applications

2019 ◽  
Vol 14 (1) ◽  
pp. 403-411
Author(s):  
Alcinei M. Nunes ◽  
Stanislav A. Moshkalev ◽  
Alexander Flacker ◽  
Peter Jurgen Tatsch ◽  
E. Besseler
Keyword(s):  
Plasma Etching ◽  
High Density ◽  
Hard Mask ◽  
Density Plasma

Dry Etching of Nanosized Si2Sb2Te5 Patterns using TiN Hard Mask for High Density Phase-change Memory

2019 ◽  
Vol 22 (1) ◽  
pp. 145-150 ◽  
Author(s):  
Gaoming Feng ◽  
Zhitang Song ◽  
Bo Liu ◽  
Songlin Feng ◽  
Baoming Chen
Keyword(s):  
Phase Change ◽  
Phase Change Memory ◽  
Dry Etching ◽  
High Density ◽  
Hard Mask ◽  
Change Memory
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