Effect of gate hard mask and sidewall spacer structures on the gate oxide reliability of W∕WN[sub x]∕poly-Si gate MOSFET for high density DRAM applications
2005 ◽
Vol 23
(3)
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pp. 1036
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1995 ◽
Vol 35
(3)
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pp. 603-608
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Keyword(s):
1995 ◽
Vol 142
(11)
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pp. L208-L211
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1998 ◽
Vol 38
(2)
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pp. 255-258
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Keyword(s):
2013 ◽
Vol 21
(3)
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pp. 580-584
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