Profile evolution during polysilicon gate etching with low-pressure high-density Cl2/HBr/O2 plasma chemistries
2001 ◽
Vol 19
(3)
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pp. 711-717
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2020 ◽
Keyword(s):
2020 ◽
Vol 76
(3)
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pp. 424-441
Keyword(s):
Keyword(s):
2000 ◽
Vol 18
(5)
◽
pp. 2224
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Keyword(s):
1998 ◽
Vol 52
(1)
◽
pp. 63-77
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