Polysilicon gate etching in high density plasmas. III. X-ray photoelectron spectroscopy investigation of sidewall passivation of silicon trenches using an oxide hard mask
1996 ◽
Vol 14
(4)
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pp. 2493
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Keyword(s):
X Ray
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1996 ◽
Vol 14
(3)
◽
pp. 1796
◽
1997 ◽
Vol 144
(7)
◽
pp. 2455-2461
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Keyword(s):
Polysilicon Gate Etching in High‐Density Plasmas: Comparison Between Oxide Hard Mask and Resist Mask
1997 ◽
Vol 144
(5)
◽
pp. 1854-1861
◽
1999 ◽
Vol 17
(4)
◽
pp. 1406
◽