Dry Etching of Nanosized Si2Sb2Te5 Patterns using TiN Hard Mask for High Density Phase-change Memory
Keyword(s):
Dry Etching of Nanosized Ge1Sb2Te4 Patterns Using TiN Hard Mask for High Density Phase-Change Memory
2009 ◽
Vol 9
(2)
◽
pp. 1526-1529
◽
Keyword(s):
2011 ◽
Vol 50
(9S1)
◽
pp. 09MD04
◽
Keyword(s):
2012 ◽
Vol 12
(10)
◽
pp. 7939-7943
Keyword(s):
Keyword(s):
2010 ◽
Vol 87
(11)
◽
pp. 2081-2084
◽
Keyword(s):