Polysilicon gate etching in high density plasmas. V. Comparison between quantitative chemical analysis of photoresist and oxide masked polysilicon gates etched in HBr/Cl2/O2 plasmas

1997 ◽  
Vol 15 (1) ◽  
pp. 88 ◽  
Author(s):  
F. H. Bell
Keyword(s):  
Chemical Analysis ◽  
High Density ◽  
Quantitative Chemical Analysis ◽  
Polysilicon Gate ◽  
Quantitative Chemical

THE UNCERTAINTY OF MEASUREMENTS AT CARRYING THE QUANTITATIVE CHEMICAL ANALYSIS OF THE SUNFLOWER SEEDS

2020 ◽  
Vol 0 (3A) ◽  
pp. 182-185
Author(s):  
І. П. Захаров ◽  
Т. В. Чуніхіна ◽  
В. Ю. Папченко ◽  
Т. В. Матвєєва
Keyword(s):  
Chemical Analysis ◽  
Quantitative Chemical Analysis ◽  
Sunflower Seeds ◽  
Uncertainty Of Measurements ◽  
Quantitative Chemical
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