Thermal Decomposition of Low Dielectric Constant Pulsed Plasma Fluorocarbon Films: I. Effect of Precursors and Substrate Temperature

1999 ◽  
Vol 146 (12) ◽  
pp. 4590-4596 ◽  
Author(s):  
Brett Cruden ◽  
Karen Chu ◽  
Karen Gleason ◽  
Herbert Sawin
Keyword(s):  
Thermal Decomposition ◽  
Dielectric Constant ◽  
Substrate Temperature ◽  
Low Dielectric Constant ◽  
Pulsed Plasma ◽  
Fluorocarbon Films ◽  
Low Dielectric

Pulsed plasma polymerization of pentafluorostyrene: Synthesis of low dielectric constant films

1998 ◽  
Vol 84 (1) ◽  
pp. 439-444 ◽  
Author(s):  
Licheng M. Han ◽  
Richard B. Timmons ◽  
Wei W. Lee ◽  
Yuanye Chen ◽  
Zhibing Hu
Keyword(s):  
Dielectric Constant ◽  
Plasma Polymerization ◽  
Low Dielectric Constant ◽  
Pulsed Plasma ◽  
Low Dielectric ◽  
Pulsed Plasma Polymerization

Low Dielectric Constant Non-Porous Fluorocarbon Films for Inter-Layer Dielectric

2007 ◽  
Author(s):  
Azumi Itoh ◽  
Atsutoshi Inokuchi ◽  
Seiji Yasuda ◽  
Akinobu Teramoto ◽  
Tetsuya Goto ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Fluorocarbon Films ◽  
Low Dielectric

Pulsed Plasma Synthesis of Low Dielectric Constant Materials

1998 ◽  
Vol 511 ◽  
Author(s):  
Licheng M. Han ◽  
Richard B. Timmons ◽  
Wei W. Lee
Keyword(s):  
Thermal Stability ◽  
Dielectric Constant ◽  
Dielectric Constants ◽  
Low Dielectric Constant ◽  
Plasma Synthesis ◽  
Pulsed Plasma ◽  
Plasma Polymers ◽  
Low Dielectric ◽  
Duty Cycles ◽  
Low Dielectric Constant Materials

ABSTRACTThe utility of a variable duty cycle, pulsed plasma polymerization technique to produce low dielectric constant materials (k < 2.3) is described. The molecular compositions (and thus the dielectric constants) of the plasma polymers are controllable via changes in the plasma duty cycles employed during synthesis, all other reaction variables being held constant. In the present study, this compositional controllability under pulsed conditions is illustrated with two fluoroaromatic monomers. The dielectric constants of the films decrease as the plasma duty cycles employed during polymerization are decreased. Although the as deposited films exhibit relatively poor thermal stability, it was discovered that post-plasma annealing of the films, particularly at 400 °C under N2, provides dramatic improvements in the thermal stability of these materials. Most importantly, this enhanced thermal stability is achieved with relatively minor changes in the dielectric properties of these materials. In fact, synthesis of high thermal stability films having k < 2.0 is demonstrated in this work using the perfluoroaromatic monomer perfluoroallyl benzene.

Low Dielectric Constant Fluorocarbon Films

1998 ◽  
Vol 544 ◽  
Author(s):  
K. K. S. Lau ◽  
K. K. Gleason
Keyword(s):  
Dielectric Constant ◽  
Chemical Vapor Deposition ◽  
Surface Properties ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Market Potential ◽  
Low Dielectric Constant ◽  
Fluorocarbon Films ◽  
Low Dielectric

IntroductionChemical vapor deposition (CVD) continues to generate immutable interest as a method of producing thin fluorocarbon films. This impetus stems from both the process advantages of CVD and the extensive market potential for the resultant films. Fluorocarbon films find extremely diverse applications because of their unique electrical, chemical and surface properties. They are currently being evaluated, among other applications, as dielectric interconnects in microelectronic circuits1–3 and as passivation coatings in clinical devices.

Low-Dielectric-Constant Nonporous Fluorocarbon Films for Interlayer Dielectric

2008 ◽  
Vol 47 (4) ◽  
pp. 2515-2520 ◽  
Author(s):  
Azumi Itoh ◽  
Atsutoshi Inokuchi ◽  
Seiji Yasuda ◽  
Akinobu Teramoto ◽  
Tetsuya Goto ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Interlayer Dielectric ◽  
Fluorocarbon Films ◽  
Low Dielectric

Study of layered diamond like carbon and PECVD fluorocarbon films for ultra low dielectric constant interlayer dielectric applications

2016 ◽  
Vol 31 (8) ◽  
pp. 1027-1037 ◽  
Author(s):  
Nandini G. Sundaram ◽  
Seetharaman Ramachandran ◽  
Lawrence Overzet ◽  
Matthew Goeckner ◽  
Gil-Sik Lee
Keyword(s):  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Diamond Like Carbon ◽  
Interlayer Dielectric ◽  
Fluorocarbon Films ◽  
Low Dielectric ◽  
Image Position

Abstract

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