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2011 ◽  
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Lori Joesten ◽  
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So Kamimura ◽  
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Resist material for negative tone development process

2010 ◽  
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Shinji Tarutani ◽  
Sou Kamimura ◽  
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Development of new high transmission eaPSM for Negative Tone Development process on wafer

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Ayako Tani ◽  
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scholarly journals Effect of Molecular Weights of 193nm Resist Polymers on the Negative Tone Development Process

2011 ◽  
Vol 24 (2) ◽  
pp. 211-217 ◽  
Author(s):  
Young C. Bae ◽  
Seung-Hyun Lee ◽  
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Jong Keun Park ◽  
Thomas Cardolaccia ◽  
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ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process

2014 ◽  
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Dong-Gyun Kim ◽  
Su-Jee Kwon ◽  
Suk-Koo Hong ◽  
Joon Je Lee ◽  
Hyung Rae Lee ◽  
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Analysis of overlay errors induced by exposure energy in negative tone development process for photolithography

2014 ◽  
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Jang-Sun Kim ◽  
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Byeong-Ok Cho ◽  
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