Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

2009 ◽  
Author(s):  
Slava Rokitski ◽  
Toshi Ishihara ◽  
Rajeskar Rao ◽  
Rui Jiang ◽  
Daniel Riggs ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Immersion Lithography ◽  
Double Patterning

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

2009 ◽  
Author(s):  
Rostislav Rokitski ◽  
Vladimir Fleurov ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Robert Rafac ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Immersion Lithography ◽  
Double Patterning

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

High reliability ArF light source for double patterning immersion lithography

2010 ◽  
Author(s):  
Rostislav Rokitski ◽  
Toshi Ishihara ◽  
Rajeskar Rao ◽  
Rui Jiang ◽  
Mary Haviland ◽  
...  
Keyword(s):  
Light Source ◽  
High Reliability ◽  
Immersion Lithography ◽  
Double Patterning

6 kHz MOPA light source for 193 nm immersion lithography

2005 ◽  
Author(s):  
Walter D. Gillespie ◽  
Toshihiko Ishihara ◽  
William N. Partlo ◽  
George X. Ferguson ◽  
Michael R. Simon
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
193 Nm

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

2010 ◽  
Author(s):  
Bencherki Mebarki ◽  
Liyan Miao ◽  
Yongmei Chen ◽  
James Yu ◽  
Pokhui Blanco ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning ◽  
Contact Space

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

2011 ◽  
Author(s):  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
Masaya Yoshino ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
High Durability ◽  
Double Patterning

Advanced light source technologies that enable high-volume manufacturing of DUV lithography extensions

2012 ◽  
Author(s):  
Theodore Cacouris ◽  
Rajasekhar Rao ◽  
Rostislav Rokitski ◽  
Rui Jiang ◽  
John Melchior ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Advanced Light Source
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