Inverse lithography as a DFM tool: accelerating design rule development with model-based assist feature placement, fast optical proximity correction and lithographic hotspot detection

2008 ◽  
Author(s):  
Steve Prins ◽  
James Blatchford ◽  
Simon Chang ◽  
Lewis Flanagin ◽  
Scott Jessen ◽  
...  
Keyword(s):  
Design Rule ◽  
Hotspot Detection ◽  
Optical Proximity Correction ◽  
Model Based

Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

2001 ◽  
Author(s):  
Hyoung-Soon Yune ◽  
Hee-Bom Kim ◽  
Wan-Ho Kim ◽  
Chang-Nam Ahn ◽  
Young-Mog Ham ◽  
...  
Keyword(s):  
Memory Device ◽  
Design Rule ◽  
Optical Proximity Correction

Kernel Count Reduction in Model Based Optical Proximity Correction Process Models

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA05 ◽  
Author(s):  
Jianliang Li ◽  
Xiaohai Li ◽  
Robert Lugg ◽  
Lawrence S. Melvin
Keyword(s):  
Process Models ◽  
Optical Proximity Correction ◽  
Model Based ◽  
Correction Process

An efficient method for transfer cross coefficient approximation in model based optical proximity correction

2008 ◽  
Author(s):  
Romuald Sabatier ◽  
Caroline Fossati ◽  
Salah Bourennane ◽  
Antonio Di Giacomo
Keyword(s):  
Efficient Method ◽  
Optical Proximity Correction ◽  
Model Based

Model-based optical proximity correction including effects of photoresist processes

1997 ◽  
Author(s):  
Jiangwei Li ◽  
Douglas A. Bernard ◽  
Juan C. Rey ◽  
Victor V. Boksha
Keyword(s):  
Optical Proximity Correction ◽  
Model Based
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