Model-based optical proximity correction including effects of photoresist processes

Author(s):  
Jiangwei Li ◽  
Douglas A. Bernard ◽  
Juan C. Rey ◽  
Victor V. Boksha
2009 ◽  
Vol 48 (6) ◽  
pp. 06FA05 ◽  
Author(s):  
Jianliang Li ◽  
Xiaohai Li ◽  
Robert Lugg ◽  
Lawrence S. Melvin

2008 ◽  
Author(s):  
Romuald Sabatier ◽  
Caroline Fossati ◽  
Salah Bourennane ◽  
Antonio Di Giacomo

Author(s):  
Doo-Youl Lee ◽  
In-Sung Kim ◽  
Sung-Gon Jung ◽  
Myoung-Ho Jung ◽  
Joo-On Park ◽  
...  

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