Extending aggressive low-k1 design rule requirements for 90 and 65 nm nodes via simultaneous optimization of numerical aperture, illumination and optical proximity correction
2005 ◽
Vol 4
(2)
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pp. 023003
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Keyword(s):
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1982 ◽
Vol 40
◽
pp. 182-185
Keyword(s):
1989 ◽
Vol 47
◽
pp. 364-365
1990 ◽
Vol 48
(1)
◽
pp. 354-355
Keyword(s):
2020 ◽
Vol 140
(11)
◽
pp. 1257-1263
2013 ◽
Vol 133
(3)
◽
pp. 290-299
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Keyword(s):