PMJ 2007 panel discussion overview: double exposure and double patterning for 32-nm half-pitch design node

2007 ◽  
Author(s):  
Yoshinori Nagaoka ◽  
Hidehiro Watanabe
Keyword(s):  
Panel Discussion ◽  
Double Exposure ◽  
Double Patterning

Double Patterning Analysis Method by Emulation Using a Double-Exposure Technique

2010 ◽  
Vol 49 (3) ◽  
pp. 035201
Author(s):  
Junji Miyazaki ◽  
Nobuhito Toyama ◽  
Akira Kawai
Keyword(s):  
Analysis Method ◽  
Double Exposure ◽  
Double Patterning ◽  
Exposure Technique

Metrology challenges of double exposure and double patterning

2007 ◽  
Author(s):  
William H. Arnold ◽  
Mircea Dusa ◽  
Jo Flinders
Keyword(s):  
Double Exposure ◽  
Double Patterning

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

LENS (lithography enhancement toward nano scale): a European project to support double exposure and double patterning technology development

2010 ◽  
Author(s):  
Pietro Cantu ◽  
Livio Baldi ◽  
Paolo Piacentini ◽  
Joost Sytsma ◽  
Bertrand Le Gratiet ◽  
...  
Keyword(s):  
Technology Development ◽  
Double Exposure ◽  
Nano Scale ◽  
European Project ◽  
Double Patterning

Advanced patterning solutions based on double exposure: double patterning and beyond

2009 ◽  
Author(s):  
Young C. Bae ◽  
Yi Liu ◽  
Thomas Cardolaccia ◽  
Ken Spizuoco ◽  
Rosemary Bell ◽  
...  
Keyword(s):  
Double Exposure ◽  
Double Patterning

Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios

2008 ◽  
Author(s):  
Andreas Erdmann ◽  
Peter Evanschitzky ◽  
Tim Fühner ◽  
Thomas Schnattinger ◽  
Cheng-Bai Xu ◽  
...  
Keyword(s):  
Electromagnetic Field ◽  
Double Exposure ◽  
Field Simulation ◽  
Double Patterning

The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation

Open Physics ◽  
2013 ◽  
Vol 11 (2) ◽  
Author(s):  
Kornelia Indykiewicz ◽  
Marcin Hajłasz ◽  
Bogdan Paszkiewicz
Keyword(s):  
High Pressure ◽  
Silicon Dioxide ◽  
Optical Lithography ◽  
New Method ◽  
Mercury Lamp ◽  
Double Exposure ◽  
Mask Aligner ◽  
Submicron Structures ◽  
Double Patterning

AbstractThis paper presents the methods of fabricating narrow parallel submicrometric stripes in silicon dioxide and a resist layer. The experiments were conducted by two techniques: double patterning lithography and double exposure lithography. In addition to the above mentioned processes, mask translation was applied. For all conducted experiments, chrome masks and a 405 nm line of the high pressure mercury lamp of an MA-56 Mask Aligner System were used. The main aim of the performed tests was to establish the utility and the possible applications of the methods used.

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