Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios

Author(s):  
Andreas Erdmann ◽  
Peter Evanschitzky ◽  
Tim Fühner ◽  
Thomas Schnattinger ◽  
Cheng-Bai Xu ◽  
...  
2010 ◽  
Vol 49 (3) ◽  
pp. 035201
Author(s):  
Junji Miyazaki ◽  
Nobuhito Toyama ◽  
Akira Kawai

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