High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

2004 ◽  
Author(s):  
Hyun S. Joo ◽  
Dong C. Seo ◽  
Chang M. Kim ◽  
Young T. Lim ◽  
Seong D. Cho ◽  
...  
Keyword(s):  
High Performance ◽  
193 Nm

High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities

2003 ◽  
Author(s):  
Mahmoud Khojasteh ◽  
K. Rex Chen ◽  
Ranee W. Kwong ◽  
Margaret C. Lawson ◽  
Pushkara R. Varanasi ◽  
...  
Keyword(s):  
High Performance ◽  
New Class ◽  
193 Nm

High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

2002 ◽  
Author(s):  
Dalil Rahman ◽  
Eric L. Alemy ◽  
Will Conley ◽  
Daniel Miller ◽  
Ralph R. Dammel ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
High Performance ◽  
Hybrid Copolymers ◽  
193 Nm

Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins)

1999 ◽  
Author(s):  
Pushkara R. Varanasi ◽  
J. Maniscalco ◽  
Ann M. Mewherter ◽  
Margaret C. Lawson ◽  
George M. Jordhamo ◽  
...  
Keyword(s):  
High Performance ◽  
Design And Development ◽  
193 Nm ◽  
Positive Resist

scholarly journals Development of High-Performance Negative-tone Resists for 193-nm Lithography

2003 ◽  
Vol 16 (4) ◽  
pp. 489-498 ◽  
Author(s):  
Takashi Hattori ◽  
Yoshiyuki Yokoyama ◽  
Kaori Kimura ◽  
Ryoko Yamanaka ◽  
Toshihiko Tanaka ◽  
...  
Keyword(s):  
High Performance ◽  
Negative Tone ◽  
193 Nm

Development of high-performance negative-tone resists for 193-nm lithography

2003 ◽  
Author(s):  
Takashi Hattori ◽  
Yoshiyuki Yokoyama ◽  
Kaori Kimura ◽  
Ryoko Yamanaka ◽  
Toshihiko Tanaka ◽  
...  
Keyword(s):  
High Performance ◽  
Negative Tone ◽  
193 Nm

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

2000 ◽  
Author(s):  
Pushkara R. Varanasi ◽  
George M. Jordhamo ◽  
Margaret C. Lawson ◽  
K. Rex Chen ◽  
William R. Brunsvold ◽  
...  
Keyword(s):  
High Performance ◽  
Single Layer ◽  
193 Nm ◽  
Positive Resist

A High Performance Energy Analyzer for Use in Electron Scanning Microscopy

1969 ◽  
Vol 27 ◽  
pp. 14-15
Author(s):  
A. V. Crewe ◽  
M. Isaacson ◽  
D. Johnson
Keyword(s):  
High Performance ◽  
Vertical Plane ◽  
Median Plane ◽  
Electron Gun ◽  
Uniform Field ◽  
Loss Mechanism ◽  
Electron Scanning Microscopy ◽  
Sector Type ◽  
Double Focusing ◽  
Electron Energy Loss

A double focusing magnetic spectrometer has been constructed for use with a field emission electron gun scanning microscope in order to study the electron energy loss mechanism in thin specimens. It is of the uniform field sector type with curved pole pieces. The shape of the pole pieces is determined by requiring that all particles be focused to a point at the image slit (point 1). The resultant shape gives perfect focusing in the median plane (Fig. 1) and first order focusing in the vertical plane (Fig. 2).

Vacuum System to Minimize the Specimen Contamination of High-Performance EM

1977 ◽  
Vol 35 ◽  
pp. 68-69
Author(s):  
N. Yoshimura ◽  
K. Shirota ◽  
T. Etoh
Keyword(s):  
Electron Microscope ◽  
High Speed ◽  
High Performance ◽  
High Vacuum ◽  
Vacuum System ◽  
Pump System ◽  
Pumping System ◽  
Diffusion Pump ◽  
Almost All ◽  
Cascade Type

One of the most important requirements for a high-performance EM, especially an analytical EM using a fine beam probe, is to prevent specimen contamination by providing a clean high vacuum in the vicinity of the specimen. However, in almost all commercial EMs, the pressure in the vicinity of the specimen under observation is usually more than ten times higher than the pressure measured at the punping line. The EM column inevitably requires the use of greased Viton O-rings for fine movement, and specimens and films need to be exchanged frequently and several attachments may also be exchanged. For these reasons, a high speed pumping system, as well as a clean vacuum system, is now required. A newly developed electron microscope, the JEM-100CX features clean high vacuum in the vicinity of the specimen, realized by the use of a CASCADE type diffusion pump system which has been essentially improved over its predeces- sorD employed on the JEM-100C.

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