Development of high-performance negative-tone resists for 193-nm lithography

2003 ◽  
Author(s):  
Takashi Hattori ◽  
Yoshiyuki Yokoyama ◽  
Kaori Kimura ◽  
Ryoko Yamanaka ◽  
Toshihiko Tanaka ◽  
...  
Keyword(s):  
High Performance ◽  
Negative Tone ◽  
193 Nm

scholarly journals Development of High-Performance Negative-tone Resists for 193-nm Lithography

2003 ◽  
Vol 16 (4) ◽  
pp. 489-498 ◽  
Author(s):  
Takashi Hattori ◽  
Yoshiyuki Yokoyama ◽  
Kaori Kimura ◽  
Ryoko Yamanaka ◽  
Toshihiko Tanaka ◽  
...  
Keyword(s):  
High Performance ◽  
Negative Tone ◽  
193 Nm

scholarly journals Negative-tone cycloolefin photoresist for 193-nm lithography

2001 ◽  
Author(s):  
ShihChi Fu ◽  
Kuo-Huang Hsieh ◽  
Lon A. Wang
Keyword(s):  
Negative Tone ◽  
193 Nm

Study of bilayer negative-tone silylation process for 193-nm lithography

2000 ◽  
Author(s):  
Hiroyuki Watanabe ◽  
Isao Satou ◽  
Masayuki Endo ◽  
Hiroaki Morimoto
Keyword(s):  
Negative Tone ◽  
193 Nm

Negative tone 193-nm photoresists

2003 ◽  
Author(s):  
Nick Pugliano ◽  
Patrick J. Bolton ◽  
Tony Barbieri ◽  
Matt King ◽  
Michael T. Reilly ◽  
...  
Keyword(s):  
Negative Tone ◽  
193 Nm

High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

2004 ◽  
Author(s):  
Hyun S. Joo ◽  
Dong C. Seo ◽  
Chang M. Kim ◽  
Young T. Lim ◽  
Seong D. Cho ◽  
...  
Keyword(s):  
High Performance ◽  
193 Nm

Negative-tone 193-nm resists

2000 ◽  
Author(s):  
Sungseo Cho ◽  
Anthony Vander Heyden ◽  
Jeff D. Byers ◽  
C. Grant Willson
Keyword(s):  
Negative Tone ◽  
193 Nm

High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities

2003 ◽  
Author(s):  
Mahmoud Khojasteh ◽  
K. Rex Chen ◽  
Ranee W. Kwong ◽  
Margaret C. Lawson ◽  
Pushkara R. Varanasi ◽  
...  
Keyword(s):  
High Performance ◽  
New Class ◽  
193 Nm

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

1999 ◽  
Author(s):  
Olivier P. Joubert ◽  
D. Fuard ◽  
Cedric Monget ◽  
Patrick Schiavone ◽  
Olivier Toublan ◽  
...  
Keyword(s):  
Process Optimization ◽  
Negative Tone ◽  
193 Nm
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