Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM

2003 ◽  
Author(s):  
Gim Chen ◽  
Julio Reyes ◽  
James L. Wood ◽  
Ismail Kashkoush ◽  
Laurent Dieu ◽  
...  
Keyword(s):  
Process Optimization ◽  
System Process ◽  
193 Nm

Redox mediated electrochemical method for vat dyeing in ferric-oxalate-gluconate system: process optimization studies

2009 ◽  
Vol 39 (12) ◽  
pp. 2569-2577 ◽  
Author(s):  
R. Senthil Kumar ◽  
K. Firoz Babu ◽  
M. Noel ◽  
M. Anbu Kulandainathan
Keyword(s):  
Process Optimization ◽  
Electrochemical Method ◽  
System Process

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

1999 ◽  
Author(s):  
Olivier P. Joubert ◽  
D. Fuard ◽  
Cedric Monget ◽  
Patrick Schiavone ◽  
Olivier Toublan ◽  
...  
Keyword(s):  
Process Optimization ◽  
Negative Tone ◽  
193 Nm

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

2002 ◽  
Author(s):  
Takanori Kudo ◽  
Eric L. Alemy ◽  
Ralph R. Dammel ◽  
Woo-Kyu Kim ◽  
Sang-Ho Lee ◽  
...  
Keyword(s):  
Process Optimization ◽  
Acid Diffusion ◽  
193 Nm
Sign in / Sign up

Export Citation Format

Share Document