Plasma polymerized methylsilane. III. Process optimization for 193 nm lithography applications

2000 ◽  
Vol 18 (2) ◽  
pp. 793 ◽  
Author(s):  
O. Joubert ◽  
D. Fuard ◽  
C. Monget ◽  
T. Weidman
Keyword(s):  
Process Optimization ◽  
193 Nm

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

1999 ◽  
Author(s):  
Olivier P. Joubert ◽  
D. Fuard ◽  
Cedric Monget ◽  
Patrick Schiavone ◽  
Olivier Toublan ◽  
...  
Keyword(s):  
Process Optimization ◽  
Negative Tone ◽  
193 Nm

Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM

2003 ◽  
Author(s):  
Gim Chen ◽  
Julio Reyes ◽  
James L. Wood ◽  
Ismail Kashkoush ◽  
Laurent Dieu ◽  
...  
Keyword(s):  
Process Optimization ◽  
System Process ◽  
193 Nm

Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

2002 ◽  
Author(s):  
Takanori Kudo ◽  
Eric L. Alemy ◽  
Ralph R. Dammel ◽  
Woo-Kyu Kim ◽  
Sang-Ho Lee ◽  
...  
Keyword(s):  
Process Optimization ◽  
Acid Diffusion ◽  
193 Nm
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