Examination of a simplified reaction-diffusion model for post-exposure bake of chemically amplified resists

2001 ◽  
Author(s):  
Mark D. Smith ◽  
Chris A. Mack
Keyword(s):  
Diffusion Model ◽  
Reaction Diffusion ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Reaction Diffusion Model ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

2011 ◽  
Author(s):  
Byungki Jung ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
Todd R. Younkin ◽  
Manish Chandhok
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

scholarly journals A new analyzing technique for nonlinear time fractional Cauchy reaction-diffusion model equations

2020 ◽  
Vol 19 ◽  
pp. 103462 ◽  
Author(s):  
Hijaz Ahmad ◽  
Tufail A. Khan ◽  
Imtiaz Ahmad ◽  
Predrag S. Stanimirović ◽  
Yu-Ming Chu
Keyword(s):  
Diffusion Model ◽  
Reaction Diffusion ◽  
Reaction Diffusion Model ◽  
Model Equations
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