Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
Latest Publications

TOTAL DOCUMENTS

114

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By Japan Society Of Applied Physics

4930813972

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Study of loading effect during development and etching process in photomask fabrication

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797549 ◽

2003 ◽

Author(s):

Ji-Hyeon Chai ◽

Byung-Gook Kim ◽

Chan-Uk Chun ◽

Sung-Yong Cho ◽

Sung-Woon Choi ◽

...

Keyword(s):

Etching Process ◽

Loading Effect

Download Full-text

Low energy e-beam proximity lithography (LEEPL)

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797462 ◽

2003 ◽

Author(s):

T. Utsumi

Keyword(s):

Low Energy

Download Full-text

Recent progress and future developments in EB mask writing for X-ray lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797450 ◽

2003 ◽

Author(s):

Y. Nakayama

Keyword(s):

Recent Progress ◽

X Ray ◽

Future Developments

Download Full-text

Coulomb blockade phenomena in low-dimensional Si MOSFETs fabricated using focused-ion beam implantation

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797509 ◽

2003 ◽

Author(s):

H. Kondo ◽

S. Baba ◽

K. Izumikawa ◽

M. Sakurai ◽

S. Zaima ◽

...

Keyword(s):

Coulomb Blockade ◽

Focused Ion Beam ◽

Ion Beam ◽

Ion Beam Implantation ◽

Low Dimensional

Download Full-text

Stress stability of W-Ti X-ray absorber in patterning process

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797498 ◽

2003 ◽

Author(s):

K. Kitamura ◽

H. Yabe ◽

S. Ami ◽

K. Kise ◽

S. Aya ◽

...

Keyword(s):

X Ray

Download Full-text

Coulomb interaction effect correction in e-beam block exposure lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797464 ◽

2003 ◽

Author(s):

K. Takahashi ◽

Y. Nara ◽

Y. Manabe ◽

H. Hoshino ◽

Y. Machida

Keyword(s):

Coulomb Interaction ◽

Interaction Effect

Download Full-text

Progress in ArF single-layer resists

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797483 ◽

2003 ◽

Author(s):

S. Takechi ◽

A. Otoguro ◽

T. Arita

Keyword(s):

Single Layer

Download Full-text

Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797492 ◽

2003 ◽

Author(s):

Eun-Mi Lee ◽

Moon-Gyu Sung ◽

Young-Mi Lee ◽

Young-Soo Sohn ◽

Hye-Keun Oh

Keyword(s):

Post Exposure ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

Post Exposure Bake ◽

193 Nm

Download Full-text

System LSI; the engine of the semiconductor industry

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797447 ◽

2003 ◽

Author(s):

F. Nakamura

Keyword(s):

Semiconductor Industry

Download Full-text

The effect of mixing development method on CD uniformity

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference ◽

10.1109/imnc.1999.797524 ◽

2003 ◽

Author(s):

H. Nakamura ◽

T. Ema ◽

K. Hayasaki ◽

S. Ito ◽

K. Okumura

Keyword(s):

Development Method

Download Full-text

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology ConferenceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Japan Society Of Applied Physics

Study of loading effect during development and etching process in photomask fabrication

Low energy e-beam proximity lithography (LEEPL)

Recent progress and future developments in EB mask writing for X-ray lithography

Coulomb blockade phenomena in low-dimensional Si MOSFETs fabricated using focused-ion beam implantation

Stress stability of W-Ti X-ray absorber in patterning process

Coulomb interaction effect correction in e-beam block exposure lithography

Progress in ArF single-layer resists

Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay

System LSI; the engine of the semiconductor industry

The effect of mixing development method on CD uniformity

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
Latest Publications