Submillisecond post-exposure bake of chemically amplified resists by CO[sub 2] laser spike annealing

2009 ◽  
Vol 27 (6) ◽  
pp. 3020 ◽  
Author(s):  
Jing Sha ◽  
Byungki Jung ◽  
Michael O. Thompson ◽  
Christopher K. Ober ◽  
Manish Chandhok ◽  
...  
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists ◽  
Spike Annealing

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

2011 ◽  
Author(s):  
Byungki Jung ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
Todd R. Younkin ◽  
Manish Chandhok
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

scholarly journals Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

2011 ◽  
Vol 24 (5) ◽  
pp. 487-490 ◽  
Author(s):  
Byungki Jung ◽  
Manish Chandhok ◽  
Todd R. Younkin ◽  
Christopher K. Ober ◽  
Michael O. Thompson
Keyword(s):  
Time Dependent ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Dependent Behavior ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake

Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7611-7614 ◽  
Author(s):  
Yuichiro Yanagishita ◽  
Shuichi Miyata ◽  
Yuko Kaimoto ◽  
Akira Oikawa ◽  
Ei Yano ◽  
...  
Keyword(s):  
Simulation Model ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake

Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study

1992 ◽  
Vol 32 (21) ◽  
pp. 1565-1570 ◽  
Author(s):  
O. Nalamasu ◽  
E. Reichmanis ◽  
J. E. Hanson ◽  
R. S. Kanga ◽  
L. A. Heimbrook ◽  
...  
Keyword(s):  
Analytical Study ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resists
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