ACS Symposium Series - Micro- and Nanopatterning Polymers
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0841235813, 0841216886
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Calixarene Resists for Nanolithography

1998 ◽  
pp. 249-261 ◽  
Author(s):  
Yoshitake Ohnishi ◽  
Naoko Wamme ◽  
Jun-ichi Fujita

Photoacid Generating Polymers for Surface Modification Resists

1998 ◽  
pp. 306-319
Author(s):  
Masamitsu Shirai ◽  
Mitsuho Masuda ◽  
Masahiro Tsunooka ◽  
Masayuki Endo ◽  
Takahiro Matsuo
Keyword(s):  
Surface Modification

Calixarene and Dendrimer as Novel Photoresist Materials

1998 ◽  
pp. 237-248 ◽  
Author(s):  
Osamu Haba ◽  
Daisuke Takahashi ◽  
Kohji Haga ◽  
Yoshimasa Sakai ◽  
Tomonari Nakayama ◽  
...  

The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach

1998 ◽  
pp. 292-305 ◽  
Author(s):  
Christopher L. McAdams ◽  
Wang Yueh ◽  
Pavlos Tsiartas ◽  
Dale Hsieh ◽  
C. Grant Willson
Keyword(s):  
Probabilistic Approach

193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives

1998 ◽  
pp. 191-207 ◽  
Author(s):  
F. M. Houlihan ◽  
A. Timko ◽  
R. Hutton ◽  
R. Cirelli ◽  
J. M. Kometani ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm

Chemistry of Ketal Resist System and Its Lithographic Performance

1998 ◽  
pp. 95-109 ◽  
Author(s):  
Wu-Song Huang ◽  
Kim Y. Lee ◽  
Rao Bantu ◽  
Ranee Kwong ◽  
Ahmad Katnani ◽  
...  
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