193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids

1998 ◽  
Author(s):  
Francis M. Houlihan ◽  
Janet M. Kometani ◽  
Allen G. Timko ◽  
Richard S. Hutton ◽  
Raymond A. Cirelli ◽  
...  
Keyword(s):  
Single Layer ◽  
Alternating Copolymers ◽  
193 Nm

Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins

1997 ◽  
Author(s):  
Francis M. Houlihan ◽  
Thomas I. Wallow ◽  
Allen G. Timko ◽  
E. Neria ◽  
Richard S. Hutton ◽  
...  
Keyword(s):  
Single Layer ◽  
Alternating Copolymers ◽  
Recent Advances ◽  
193 Nm

Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

1996 ◽  
Author(s):  
Thomas I. Wallow ◽  
Francis M. Houlihan ◽  
Omkaram Nalamasu ◽  
Edwin A. Chandross ◽  
Thomas X. Neenan ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
Alternating Copolymers ◽  
193 Nm

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

1997 ◽  
Vol 30 (21) ◽  
pp. 6517-6524 ◽  
Author(s):  
F. M. Houlihan ◽  
T. I. Wallow ◽  
O. Nalamasu ◽  
E. Reichmanis
Keyword(s):  
Maleic Anhydride ◽  
Alternating Copolymers ◽  
193 Nm

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

A New Single-Layer Resist for 193-nm Lithography

1996 ◽  
Vol 35 (Part 2, No. 4B) ◽  
pp. L528-L530 ◽  
Author(s):  
Koji Nozaki ◽  
Keiji Watanabe ◽  
Takahisa Namiki ◽  
Miwa Igarashi ◽  
Yoko Kuramitsu ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

scholarly journals Single layer resists with enhanced etch resistance for 193 nm lithography.

1994 ◽  
Vol 7 (3) ◽  
pp. 507-516 ◽  
Author(s):  
ROBERT D. ALLEN ◽  
GREGORY M. WALLRAFF ◽  
RICHARD A. DIPIETRO ◽  
DONALD C. HOFER ◽  
RODERICK R. KUNZ
Keyword(s):  
Single Layer ◽  
193 Nm

Novel single-layer photoresist containing cycloolefins for 193 nm

1998 ◽  
Author(s):  
Joo Hyeon Park ◽  
Dong-Chul Seo ◽  
Ki-Dae Kim ◽  
Sun-Yi Park ◽  
Seong-Ju Kim ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

scholarly journals A Commercially Viable 193 nm Single Layer Resist Platform.

1997 ◽  
Vol 10 (3) ◽  
pp. 511-520 ◽  
Author(s):  
F.M. Houlihan ◽  
T. Wallow ◽  
A. Timko ◽  
E. Neria ◽  
R. Hutton ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm

Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging

2000 ◽  
Vol 18 (6) ◽  
pp. 3340 ◽  
Author(s):  
Ebo Croffie ◽  
Lei Yuan ◽  
Mosong Cheng ◽  
Andrew Neureuther ◽  
Frank Houlihan ◽  
...  
Keyword(s):  
Structural Changes ◽  
Single Layer ◽  
Photoacid Generators ◽  
193 Nm

scholarly journals Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

1996 ◽  
Vol 9 (3) ◽  
pp. 475-488 ◽  
Author(s):  
Satoshi Takechi ◽  
Makoto Takahashi ◽  
Akiko Kotachi ◽  
Koji Nozaki ◽  
Ei Yano ◽  
...  
Keyword(s):  
Single Layer ◽  
193 Nm
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