Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

1996 ◽  
Author(s):  
Thomas I. Wallow ◽  
Francis M. Houlihan ◽  
Omkaram Nalamasu ◽  
Edwin A. Chandross ◽  
Thomas X. Neenan ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
Alternating Copolymers ◽  
193 Nm

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

1997 ◽  
Vol 30 (21) ◽  
pp. 6517-6524 ◽  
Author(s):  
F. M. Houlihan ◽  
T. I. Wallow ◽  
O. Nalamasu ◽  
E. Reichmanis
Keyword(s):  
Maleic Anhydride ◽  
Alternating Copolymers ◽  
193 Nm

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives

1998 ◽  
pp. 191-207 ◽  
Author(s):  
F. M. Houlihan ◽  
A. Timko ◽  
R. Hutton ◽  
R. Cirelli ◽  
J. M. Kometani ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm

New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins

1999 ◽  
Author(s):  
Ilya L. Rushkin ◽  
Francis M. Houlihan ◽  
Janet M. Kometani ◽  
Richard S. Hutton ◽  
Allen G. Timko ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm

scholarly journals A New 193 nm Single Layer Resist Based on Cycloolefin Maleic Anhydride Polymers.

2000 ◽  
Vol 13 (4) ◽  
pp. 651-656
Author(s):  
Si-Hyeung Lee ◽  
Ki-Young Kwon ◽  
Dong-Won Jung ◽  
Sook Lee ◽  
Kwang-Sub Yoon ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm

Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins

1997 ◽  
Author(s):  
Francis M. Houlihan ◽  
Thomas I. Wallow ◽  
Allen G. Timko ◽  
E. Neria ◽  
Richard S. Hutton ◽  
...  
Keyword(s):  
Single Layer ◽  
Alternating Copolymers ◽  
Recent Advances ◽  
193 Nm

193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids

1998 ◽  
Author(s):  
Francis M. Houlihan ◽  
Janet M. Kometani ◽  
Allen G. Timko ◽  
Richard S. Hutton ◽  
Raymond A. Cirelli ◽  
...  
Keyword(s):  
Single Layer ◽  
Alternating Copolymers ◽  
193 Nm

Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists

Polymer ◽  
2000 ◽  
Vol 41 (22) ◽  
pp. 8035-8039 ◽  
Author(s):  
J.-B Kim ◽  
H.-J Yun ◽  
Y.-G Kwon ◽  
B.-W Lee
Keyword(s):  
Maleic Anhydride ◽  
193 Nm ◽  
Norbornene Derivatives
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