Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/ tert -butyl acrylate)

2001 ◽  
Author(s):  
Francis M. Houlihan ◽  
Donna Person ◽  
Omkaram Nalamasu ◽  
Ilya Rushkin ◽  
Ognian N. Dimov ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Single Layer ◽  
Tert Butyl ◽  
193 Nm

Synthesis ofO-Phosphorylserine-Terminated Poly(tert-butyl acrylate) and Poly(acrylic acid)

1996 ◽  
Vol 29 (12) ◽  
pp. 4442-4443
Author(s):  
Masataka Kubo ◽  
Anne Buyle Padias ◽  
H. K. Hall ◽  
Paul D. Calvert
Keyword(s):  
Acrylic Acid ◽  
Butyl Acrylate ◽  
Tert Butyl ◽  
Poly Acrylic Acid

193 nm Single Layer Resist Based on Poly(norbornene-alt-maleic anhydride) Derivatives

1998 ◽  
pp. 191-207 ◽  
Author(s):  
F. M. Houlihan ◽  
A. Timko ◽  
R. Hutton ◽  
R. Cirelli ◽  
J. M. Kometani ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm

New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins

1999 ◽  
Author(s):  
Ilya L. Rushkin ◽  
Francis M. Houlihan ◽  
Janet M. Kometani ◽  
Richard S. Hutton ◽  
Allen G. Timko ◽  
...  
Keyword(s):  
Maleic Anhydride ◽  
Single Layer ◽  
193 Nm
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