Studying Density vs Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard x-ray telescopes

1997 ◽  
Author(s):  
Ahsen M. Hussain ◽  
Suzanne E. Romaine ◽  
Paul Gorenstein ◽  
John E. Everett ◽  
Ricardo J. Bruni ◽  
...  
1995 ◽  
Vol 382 ◽  
Author(s):  
D. G. Stearns ◽  
K. M. Skulina ◽  
M. Wall ◽  
C. S. Alford ◽  
R. M. Bionta ◽  
...  

ABSTRACTMultilayer (ML) structures composed of Mo-Be, Ru-Be and Rh-Be with bilayer periods of - 6 nm have been grown using dc magnetron sputter deposition. The ML microstructure has been characterized using x-ray diffraction and high-resolution transmission electron microscopy, and the normal incidence reflectivity has been measured at soft x-ray wavelengths.


2008 ◽  
Vol 2008 ◽  
pp. 1-9 ◽  
Author(s):  
Anette Vickery ◽  
Carsten P. Jensen ◽  
Finn E. Christensen ◽  
Mads Peter Steenstrup ◽  
Troels Schønfeldt

At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively.


2009 ◽  
Vol 6 ◽  
pp. 29-34
Author(s):  
Wan Yu Wu ◽  
Chia Wei Hsu ◽  
Jyh Ming Ting

We have investigated the growth and characteristics of nanoscaled thin films of carbon, nickel, and platinum. The nanoscaled thin films were deposited on Si and quartz substrates with or without a surface layer of carbon, nickel, or platinum using a DC magnetron sputter deposition technique. The thicknesses, which were determined using ellipsometry, are all less than 10 nm. The film structures were examined using glazing angle incident x-ray diffractometry and Raman spectroscopy. The electrical and optical properties were determined using a four point probe technique and UV-VIS-IR spectrometry, respectively.


2014 ◽  
Vol 17 (2) ◽  
pp. 47-55
Author(s):  
Cam Thi Mong Dinh ◽  
Thang Bach Phan ◽  
Hoang Thanh Nguyen

One-dimensional (1-D) zinc oxide (ZnO) nanostructures, such as ZnO nanowires and nanorods, have in recent years attracted a lot of attention due to their many unique properties and possibility that can be applied to various nanoscale functional devices. In this study, ZnO nanowires have been successfully synthesized on Ti/glass substrates by an DC magnetron sputter deposition technique. Deposition of ZnO using this technique generally leads to the formation of ZnO thin film but not of nanowire. So prior to the ZnO deposition, a Cu labyer was prepared on the Ti/glass substrate using an electroless plating method under different conditions. X-ray diffraction (XRD) analysis confirmed that the ZnO nanowires with wurtzite structures have high crystal quality and are c-axis orientated. Scanning electron microscopy (SEM) showed the diameters of nanowires normally range from 60 to 150 nm and their lengths reach 20 μm. Photoluminescence (PL) measurements were adopted to analyze the optical properties of the nanowires. The existence of an electroless Cu layer is critical for the growth of the ZnO nanowires. In addition, the effect of the Cu deposition conditions on the diameters and lengths of the ZnO nanowires is discussed in details.


1991 ◽  
Vol 137-138 ◽  
pp. 783-786 ◽  
Author(s):  
Alan M. Myers ◽  
James R. Doyle ◽  
G. Jeff Feng ◽  
Nagi Maley ◽  
David L. Ruzic ◽  
...  

2013 ◽  
Vol 662 ◽  
pp. 413-416
Author(s):  
Yi Shen ◽  
Ruo He Yao

Al films were prepared by DC magnetron sputter deposition at different substrate temperatures. The sheet resistance of the films was measured by four point probe sheet resistance meter, and the film thickness, which was obtained by surface profiling system. The surface and cross-section morphology of the films was observed by AFM and FESEM. As a result, the resistivity of the films decreases obviously as the substrate temperature increases gradually. The higher substrate temperature is, the rougher the films surface is and the larger the grain size is.


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