Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer

2021 ◽  
Author(s):  
Anette Löfstrand ◽  
Reza Jafari Jam ◽  
Muhammad Mumtaz ◽  
Karolina Mothander ◽  
Tommy Nylander ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Pattern Transfer

Evolution of roughness during the pattern transfer of high-chi, 10nm half-pitch, silicon-containing block copolymer structures

2018 ◽  
Author(s):  
Gregory Blachut ◽  
Stephen M. Sirard ◽  
Diane Hymes ◽  
Chris A. Mack ◽  
Michael J. Maher ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Pattern Transfer

scholarly journals Influence of block copolymer feature size on reactive ion etching pattern transfer into silicon

2017 ◽  
Vol 28 (40) ◽  
pp. 404001 ◽  
Author(s):  
M Dialameh ◽  
F Ferrarese Lupi ◽  
D Imbraguglio ◽  
F Zanenga ◽  
A Lamperti ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Reactive Ion Etching ◽  
Pattern Transfer ◽  
Feature Size ◽  
Ion Etching ◽  
Etching Pattern

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

2013 ◽  
Vol 534 ◽  
pp. 126-130 ◽  
Author(s):  
Takashi Akahane ◽  
Takuya Komori ◽  
Jing Liu ◽  
Miftakhul Huda ◽  
Zulfakri bin Mohamad ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Carbon Film ◽  
Pattern Transfer ◽  
Si Substrate ◽  
Hard Mask ◽  
Dimethyl Siloxane ◽  
Transfer Pattern

In this work, improvement of the observation contrast was investigated by using a carbon film as the hard mask for pattern transfer of block copolymer (BCP) nanodots. The PS-PDMS (Poly (styrene-b-dimethyl siloxane)) block copolymer was adopted here. The observation contrast was greatly improved after transferring block copolymer (BCP) nanodots pattern to the underlying Si substrate through the carbon hard mask compared that before nanodot pattern transfer. Pattern transfer was also demonstrated to be very effective using carbon hard mask.

Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots

2013 ◽  
Vol 596 ◽  
pp. 88-91
Author(s):  
Jing Liu ◽  
Miftakhul Huda ◽  
Zulfakri bin Mohamad ◽  
Hui Zhang ◽  
You Yin ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Molecular Mass ◽  
Pattern Transfer ◽  
Si Substrate ◽  
Carbon Tetrafluoride ◽  
Dimethyl Siloxane ◽  
Nanodot Arrays ◽  
Self Assembled ◽  
Ultrahigh Density ◽  
20 Nm

We investigated the fabrication of self-assembled nanodot array using poly (styrene)-poly (dimethyl-siloxane) (PS-PDMS) block copolymer and its transfer technique as a promising method to fabricate magnetic nanodot arrays for ultrahigh density recording. A carbon (C) layer with a high etch-resistance was especially adopted for magnetic nanodot fabrication. We fabricated PDMS nanodot using PS-PDMS block copolymer with a molecular mass of 11,700-2,900 g/mol. The nanodots were first transferred into silicon (Si) layer and then into C layer on Si substrate by carbon tetrafluoride (CF4) and oxygen (O2) reactive ion etching (RIE), respectively. We succeeded in fabricating C nanodots with a diameter of 10 nm and an average pitch of 20 nm.

Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications

Soft Matter ◽  
2017 ◽  
Vol 13 (40) ◽  
pp. 7406-7411 ◽  
Author(s):  
I. Otsuka ◽  
N. Nilsson ◽  
D. B. Suyatin ◽  
I. Maximov ◽  
R. Borsali
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Regular Structures

Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach, which looks especially promising for fabrication of regular structures with characteristic sizes below 10 nm. Nevertheless, directed self-assembly (DSA) and pattern transfer for BCPs with such small features remain to be a challenge.

In-depth TEM characterization of block copolymer pattern transfer at germanium surfaces

2016 ◽  
Vol 27 (48) ◽  
pp. 484003 ◽  
Author(s):  
Cian Cummins ◽  
Timothy W Collins ◽  
Roisin A Kelly ◽  
Eoin K McCarthy ◽  
Michael A Morris
Keyword(s):  
Block Copolymer ◽  
Pattern Transfer ◽  
Tem Characterization

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

ACS Nano ◽  
2017 ◽  
Vol 11 (8) ◽  
pp. 7656-7665 ◽  
Author(s):  
Austin P. Lane ◽  
XiaoMin Yang ◽  
Michael J. Maher ◽  
Gregory Blachut ◽  
Yusuke Asano ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Pattern Transfer
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