Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

ACS Nano ◽  
2017 ◽  
Vol 11 (8) ◽  
pp. 7656-7665 ◽  
Author(s):  
Austin P. Lane ◽  
XiaoMin Yang ◽  
Michael J. Maher ◽  
Gregory Blachut ◽  
Yusuke Asano ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Pattern Transfer

Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications

Soft Matter ◽  
2017 ◽  
Vol 13 (40) ◽  
pp. 7406-7411 ◽  
Author(s):  
I. Otsuka ◽  
N. Nilsson ◽  
D. B. Suyatin ◽  
I. Maximov ◽  
R. Borsali
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Regular Structures

Self-assembly of block copolymers (BCPs) provides an attractive nanolithography approach, which looks especially promising for fabrication of regular structures with characteristic sizes below 10 nm. Nevertheless, directed self-assembly (DSA) and pattern transfer for BCPs with such small features remain to be a challenge.

Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film

2017 ◽  
Vol 28 (14) ◽  
pp. 145301 ◽  
Author(s):  
Li-Chen Cheng ◽  
Wubin Bai ◽  
Eduardo Fernandez Martin ◽  
Kun-Hua Tu ◽  
Konstantinos Ntetsikas ◽  
...  
Keyword(s):  
Molecular Weight ◽  
Block Copolymer ◽  
High Molecular Weight ◽  
Self Assembly ◽  
Copolymer Film ◽  
Pattern Transfer

scholarly journals Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer

Nanoscale ◽  
2015 ◽  
Vol 7 (15) ◽  
pp. 6712-6721 ◽  
Author(s):  
Cian Cummins ◽  
Anushka Gangnaik ◽  
Roisin A. Kelly ◽  
Dipu Borah ◽  
John O'Connell ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Metal Oxide ◽  
Self Assembly ◽  
Pattern Transfer

A strategy combining graphoepitaxy and a metal oxide enhanced PS-b-P4VP BCP is utilized for generating aligned Si nanofins with 10 nm feature sizes.

Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF4 Etching with Carbon Hard Mask (CHM) as Mask

2013 ◽  
Vol 737 ◽  
pp. 133-136 ◽  
Author(s):  
Miftakhul Huda ◽  
Jing Liu ◽  
Zulfakri bin Mohamad ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Promising Alternative ◽  
Hard Mask ◽  
Dimethyl Siloxane ◽  
Assembly Technique ◽  
Self Assembled ◽  
Ultrahigh Density ◽  
Potential Use

The self-assembly of block copolymer (BCP) has demonstrated as promising alternative technology to overcome the limitation of conventional lithography owing to its ability in forming nanostructure with size 3-100 nm. In this study, we investigated a technique to transfer self-assembled nanodots of Poly(styrene-b-dimethyl siloxane) (PS-PDMS) BCP to Si. The pattern transfer of PS-PDMS nanodots with the pitch of 33 nm and the diameter of 23 nm using CF4 etching with Carbon Hard Mask (CHM) as Mask is demonstrated. Si nanopillar with height of 51 nm was fabricated. This result improves the potential use of PS-PDMS BCP self-assembly technique for fabrication nano-electronic devices, such as quantum dot solar cell and ultrahigh density of magnetic recording.

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Oxidation and ATP dual-responsive block copolymer containing tertiary sulfoniums: self-assembly, protein complexation and triggered release

2021 ◽  
Author(s):  
Yanfen Jiang ◽  
Shuqi Dong ◽  
Guoyang Qin ◽  
Li Liu ◽  
Hanying Zhao
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Phenylboronic Acid ◽  
Cationic Polymer ◽  
Release Profile ◽  
Triggered Release ◽  
Dual Responsive ◽  
Protein Complexation

Alkylation of thioether-containing block copolymer simultaneously incorporated sulfoniums and phenylboronic acid moieties. The co-assembly of this cationic polymer and protein generated micelles with an H2O2-and ATP-responsive release profile.

scholarly journals Mesoporous Titanium Oxynitride Monoliths from Block Copolymer-Directed Self-Assembly of Metal–Urea Additives

Langmuir ◽  
2020 ◽  
Vol 36 (36) ◽  
pp. 10803-10810
Author(s):  
Yun Li ◽  
Raymond Horia ◽  
Wei Xin Tan ◽  
Nathawat Larbaram ◽  
Wardhana A. Sasangka ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly
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