Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes

2014 ◽  
pp. n/a-n/a ◽  
Author(s):  
Chunlin He ◽  
Mark P. Stoykovich
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Pattern Transfer ◽  
Transfer Processes ◽  
Profile Control

The Effect of Hydrogen-Based, High Density Plasma Etching on the Electronic Properties of Gallium Nitride

1995 ◽  
Vol 395 ◽  
Author(s):  
C.R. Eddy ◽  
B. Molnar
Keyword(s):  
Thin Films ◽  
Gallium Nitride ◽  
Electrical Properties ◽  
Electronic Properties ◽  
High Performance ◽  
Electron Cyclotron Resonance ◽  
Microwave Plasma ◽  
Pattern Transfer ◽  
Transfer Processes ◽  
Etching System

ABSTRACTDevelopment of devices based on the wide gap semiconductor gallium nitride (GaN) requires the realization of reliable, high fidelity, low damage pattern transfer processes. In this work, GaN thin films grown by OMVPE have been subjected to both chlorine- and methane/hydrogen-based etch chemistries in an electron cyclotron resonance microwave plasma reactive ion etching system. Both n-type and semi-insulating thin films have been utilized to examine the effect of these etch processes on the electronic properties of the materials. The methane/hydrogen-based etch system (CH4/H2/Ar) induced considerable changes in the electrical properties of both n-type and semi-insulating films, causing the former to become more insulating and the latter to become conducting. In both cases, the original electrical properties were recoverable after a short, high temperature anneal. In the chlorine-based etching system (Cl2), no changes in the electrical properties were observed and etch rates five times greater than in the methane/hydrogen-based system were achieved. Proposed mechanisms responsible for the observed behavior will be discussed. These results show that pattern transfer processes based in chlorine etch chemistries are more suitable for the generation of high performance GaN devices.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

scholarly journals Continuous Equilibrated Growth of Ordered Block Copolymer Thin Films by Electrospray Deposition

ACS Nano ◽  
2013 ◽  
Vol 7 (4) ◽  
pp. 2960-2970 ◽  
Author(s):  
Hanqiong Hu ◽  
Sofia Rangou ◽  
Myungwoong Kim ◽  
Padma Gopalan ◽  
Volkan Filiz ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Electrospray Deposition

Structure of symmetric polyolefin block copolymer thin films

1992 ◽  
Vol 96 (11) ◽  
pp. 8605-8615 ◽  
Author(s):  
Mark D. Foster ◽  
Mohan Sikka ◽  
Navjot Singh ◽  
Frank S. Bates ◽  
Sushil K. Satija ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer

Effect of Block Copolymer Architecture on the Thermally Induced Swelling of Micelle-Containing Multilayer Thin Films

2011 ◽  
Vol 44 (19) ◽  
pp. 7767-7774 ◽  
Author(s):  
Wui Siew Tan ◽  
Zhichen Zhu ◽  
Svetlana A. Sukhishvili ◽  
Michael F. Rubner ◽  
Robert E. Cohen
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Multilayer Thin Films ◽  
Thermally Induced

scholarly journals Rapid thermal processing of self-assembling block copolymer thin films

2013 ◽  
Vol 24 (31) ◽  
pp. 315601 ◽  
Author(s):  
F Ferrarese Lupi ◽  
T J Giammaria ◽  
M Ceresoli ◽  
G Seguini ◽  
K Sparnacci ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Self Assembling

scholarly journals Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents

2015 ◽  
Vol 25 (20) ◽  
pp. 3057-3065 ◽  
Author(s):  
Michelle A. Chavis ◽  
Detlef-M. Smilgies ◽  
Ulrich B. Wiesner ◽  
Christopher K. Ober
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Vapor ◽  
Selective Solvents ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing
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