Silicon Wafer Etching Rate Characteristics with Burst Width Using 150 kHz Band High-Power Burst Inductively Coupled Plasma

The high-speed etching of a silicon wafer was experimentally investigated, focusing on the duty factor of 150 kHz band high-power burst inductively coupled plasma. The pulse burst width was varied in the range of 400–1000 µs and the repetition rate was set to 10 Hz. A mixture of argon (Ar) and carbon tetrafluoride (CF4) gas was used as the etching gas and injected into the vacuum chamber. The impedance was changed with time, and the coil voltage and current were changed to follow it. During the discharge, about 3 kW of power was applied. The electron temperature and plasma density were measured by the double probe method. The plasma density in the etching region was 1018–1019 m−3. The target current increased with t burst width. The etching rate of Ar discharge at burst width of 1000 µs was 0.005 µm/min. Adding CF4 into Ar, the etching rate became 0.05 µm/min, which was about 10 times higher. The etching rate increased with burst width.

Simple Fabrication of Transparent, Colorless, and Self-Disinfecting Polyethylene Terephthalate Film via Cold Plasma Treatment

Cross-infection following cross-contamination is a serious social issue worldwide. Pathogens are normally spread by contact with germ-contaminated surfaces. Accordingly, antibacterial surface technologies are urgently needed and have consequently been actively developed in recent years. Among these technologies, biomimetic nanopatterned surfaces that physically kill adhering bacteria have attracted attraction as an effective technological solution to replace toxic chemical disinfectants (biocides). Herein, we introduce a transparent, colorless, and self-disinfecting polyethylene terephthalate (PET) film that mimics the surface structure of the Progomphus obscurus (sanddragon) wing physically killing the attached bacteria. The PET film was partially etched via a 4-min carbon tetrafluoride (CF4) plasma treatment. Compared to a flat bare PET film, the plasma-treated film surface exhibited a uniform array structure composed of nanopillars with a 30 nm diameter, 237 nm height, and 75 nm pitch. The plasma-treated PET film showed improvements in optical properties (transmittance and B*) and antibacterial effectiveness over the bare film; the transparency and colorlessness slightly increased, and the antibacterial activity increased from 53.8 to 100% for Staphylococcus aureus, and from 0 to 100% for Escherichia coli. These results demonstrated the feasibility of the CF4 plasma-treated PET film as a potential antibacterial overcoating with good optical properties.