Advanced Etch Technology for Nanopatterning VII
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Published By SPIE

9781510616707, 9781510616714
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

2018 ◽  
Author(s):  
Danilo De Simone ◽  
Sophie Thibaut ◽  
Angelique Raley ◽  
Frederic Lazarrino ◽  
Ming Mao ◽  
...  
Keyword(s):  
Low Dose

Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering

2018 ◽  
Author(s):  
Soo Doo Chae ◽  
Tsuyoshi Moriya ◽  
Shimpei Tsujikawa ◽  
Kiyotaka Imai ◽  
Eric Liu ◽  
...  
Keyword(s):  
Stress Engineering

Introduction of pre-etch deposition techniques in EUV patterning

2018 ◽  
Author(s):  
Xun Xiang ◽  
Andre Labonte ◽  
Catherine Labelle ◽  
Bhaskar Nagabhirava ◽  
Phil Friddle ◽  
...  
Keyword(s):  
Deposition Techniques

Evolution of roughness during the pattern transfer of high-chi, 10nm half-pitch, silicon-containing block copolymer structures

2018 ◽  
Author(s):  
Gregory Blachut ◽  
Stephen M. Sirard ◽  
Diane Hymes ◽  
Chris A. Mack ◽  
Michael J. Maher ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Pattern Transfer

Exploration of BEOL line-space patterning options at 12 nm half-pitch and below

2018 ◽  
Author(s):  
Sandip Halder ◽  
Gayle Murdoch ◽  
Arindam Mallik ◽  
Stefan Decoster ◽  
Frederic Lazzarino ◽  
...  
Keyword(s):  
Line Space
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