Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

2013 ◽  
Author(s):  
J. Paul ◽  
M. Rudolph ◽  
S. Riedel ◽  
X. Thrun ◽  
S. Wege ◽  
...  
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Hard Mask

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer

ACS Nano ◽  
2018 ◽  
Vol 12 (11) ◽  
pp. 11152-11160 ◽  
Author(s):  
Jean-François de Marneffe ◽  
Boon Teik Chan ◽  
Martin Spieser ◽  
Guy Vereecke ◽  
Sergej Naumov ◽  
...  
Keyword(s):  
High Resolution ◽  
High Performance ◽  
Pattern Transfer ◽  
Hard Mask

High resolution pattern transfer in III-nitrides using BCl3/Ar inductively coupled plasmas

1998 ◽  
Vol 42 (9) ◽  
pp. 1719-1722
Author(s):  
Hyun Cho ◽  
S.M Donovan ◽  
J.D MacKenzie ◽  
C.R Abernathy ◽  
S.J Pearton ◽  
...  
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

High Resolution Patterning for Sub 30 nm Technology Nodes Using a Ceramic Based Dual Hard Mask

2013 ◽  
Vol 50 (46) ◽  
pp. 21-31
Author(s):  
J. Paul ◽  
M. Rudolph ◽  
S. Riedel ◽  
X. Thrun ◽  
V. Beyer ◽  
...  
Keyword(s):  
High Resolution ◽  
Hard Mask ◽  
Technology Nodes

Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)

2013 ◽  
Vol 534 ◽  
pp. 126-130 ◽  
Author(s):  
Takashi Akahane ◽  
Takuya Komori ◽  
Jing Liu ◽  
Miftakhul Huda ◽  
Zulfakri bin Mohamad ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Carbon Film ◽  
Pattern Transfer ◽  
Si Substrate ◽  
Hard Mask ◽  
Dimethyl Siloxane ◽  
Transfer Pattern

In this work, improvement of the observation contrast was investigated by using a carbon film as the hard mask for pattern transfer of block copolymer (BCP) nanodots. The PS-PDMS (Poly (styrene-b-dimethyl siloxane)) block copolymer was adopted here. The observation contrast was greatly improved after transferring block copolymer (BCP) nanodots pattern to the underlying Si substrate through the carbon hard mask compared that before nanodot pattern transfer. Pattern transfer was also demonstrated to be very effective using carbon hard mask.

A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

2017 ◽  
Vol 1 (9) ◽  
pp. 1895-1899 ◽  
Author(s):  
Santu Nandi ◽  
Midathala Yogesh ◽  
Pulikanti Guruprasad Reddy ◽  
Satinder K. Sharma ◽  
Chullikkattil P. Pradeep ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Pattern Transfer ◽  
Photoacid Generator ◽  
Transfer Potential

A new PAG integrated electron beam active terpolymer resist has been developed for high resolution pattern transfer applications.

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