High Resolution Patterning for Sub 30 nm Technology Nodes Using a Ceramic Based Dual Hard Mask

2013 ◽  
Vol 50 (46) ◽  
pp. 21-31
Author(s):  
J. Paul ◽  
M. Rudolph ◽  
S. Riedel ◽  
X. Thrun ◽  
V. Beyer ◽  
...  
Keyword(s):  
High Resolution ◽  
Hard Mask ◽  
Technology Nodes

SEM-Based Nanoprobing on 40, 32 and 28 nm CMOS Devices Challenges for Semiconductor Failure Analysis

2013 ◽  
Author(s):  
Erik Paul ◽  
Holger Herzog ◽  
Sören Jansen ◽  
Christian Hobert ◽  
Eckhard Langer
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Failure Analysis ◽  
Case Studies ◽  
State Of The Art ◽  
Root Cause ◽  
Highly Efficient ◽  
Technology Nodes ◽  
Scanning Electron

Abstract This paper presents an effective device-level failure analysis (FA) method which uses a high-resolution low-kV Scanning Electron Microscope (SEM) in combination with an integrated state-of-the-art nanomanipulator to locate and characterize single defects in failing CMOS devices. The presented case studies utilize several FA-techniques in combination with SEM-based nanoprobing for nanometer node technologies and demonstrate how these methods are used to investigate the root cause of IC device failures. The methodology represents a highly-efficient physical failure analysis flow for 28nm and larger technology nodes.

Optimization of Cu/Low-k Dual Damascene Post-Etch Residue and TiN Hard Mask Removal

2016 ◽  
Vol 255 ◽  
pp. 237-241
Author(s):  
Alexander Kabansky ◽  
Glenn Westwood ◽  
Samantha Tan ◽  
Frederic Kovacs ◽  
David Lou ◽  
...  
Keyword(s):  
Chemical Process ◽  
Advanced Technology ◽  
Hard Mask ◽  
Lifetime Optimization ◽  
One Step ◽  
Wet Chemical ◽  
The One ◽  
Technology Nodes ◽  
Low K ◽  
Etch Residue

For advanced technology nodes TiN hard mask integration into Cu/low-k via/trench DD process requires the mask to be fully stripped after DD etching. The one-step H2O2 containing wet chemical clean aiming to removing TiN mask often failed to simultaneously clean etch residue. We developed more reliable two-step wet chemical process combining a solvent-based post-etch residue clean followed by a solvent/H2O2 mixture strip for TiN mask removal. Bath lifetime optimization was also demonstrated.

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer

ACS Nano ◽  
2018 ◽  
Vol 12 (11) ◽  
pp. 11152-11160 ◽  
Author(s):  
Jean-François de Marneffe ◽  
Boon Teik Chan ◽  
Martin Spieser ◽  
Guy Vereecke ◽  
Sergej Naumov ◽  
...  
Keyword(s):  
High Resolution ◽  
High Performance ◽  
Pattern Transfer ◽  
Hard Mask

Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

2013 ◽  
Author(s):  
J. Paul ◽  
M. Rudolph ◽  
S. Riedel ◽  
X. Thrun ◽  
S. Wege ◽  
...  
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Hard Mask

Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write

2009 ◽  
Author(s):  
László Szikszai ◽  
Philipp Jaschinsky ◽  
Katja Keil ◽  
Marc Hauptmann ◽  
Manfred Mört ◽  
...  
Keyword(s):  
High Resolution ◽  
Direct Write ◽  
Future Technology ◽  
Technology Nodes

Improvement of high resolution lithography by using amorphous carbon hard mask

2008 ◽  
Vol 85 (5-6) ◽  
pp. 800-804 ◽  
Author(s):  
S. Pauliac-Vaujour ◽  
P. Brianceau ◽  
C. Comboroure ◽  
O. Faynot
Keyword(s):  
High Resolution ◽  
Amorphous Carbon ◽  
Hard Mask

Observations of the spatial structure of interstellar hydrogen

1967 ◽  
Vol 31 ◽  
pp. 45-46
Author(s):  
Carl Heiles
Keyword(s):  
High Resolution ◽  
Spatial Structure ◽  
Velocity Dispersion ◽  
Temperature Variations

High-resolution 21-cm line observations in a region aroundlII= 120°,b11= +15°, have revealed four types of structure in the interstellar hydrogen: a smooth background, large sheets of density 2 atoms cm-3, clouds occurring mostly in groups, and ‘Cloudlets’ of a few solar masses and a few parsecs in size; the velocity dispersion in the Cloudlets is only 1 km/sec. Strong temperature variations in the gas are in evidence.

Combining integrated systems-biology approaches with intervention-based experimental design provides a higher-resolution path forward for microbiome research

2019 ◽  
Vol 42 ◽  
Author(s):  
J. Alfredo Blakeley-Ruiz ◽  
Carlee S. McClintock ◽  
Ralph Lydic ◽  
Helen A. Baghdoyan ◽  
James J. Choo ◽  
...  
Keyword(s):  
Systems Biology ◽  
High Resolution ◽  
Experimental Design ◽  
Integrated Systems ◽  
Microbiome Research ◽  
Constructive Criticism

Abstract The Hooks et al. review of microbiota-gut-brain (MGB) literature provides a constructive criticism of the general approaches encompassing MGB research. This commentary extends their review by: (a) highlighting capabilities of advanced systems-biology “-omics” techniques for microbiome research and (b) recommending that combining these high-resolution techniques with intervention-based experimental design may be the path forward for future MGB research.

Very High Resolution Analysis of the Dynamics of a Coronal Plasmoid

1994 ◽  
Vol 144 ◽  
pp. 593-596
Author(s):  
O. Bouchard ◽  
S. Koutchmy ◽  
L. November ◽  
J.-C. Vial ◽  
J. B. Zirker
Keyword(s):  
High Resolution ◽  
Solar Eclipse ◽  
Total Solar Eclipse ◽  
Field Of View ◽  
Small Field ◽  
High Resolution Analysis ◽  
Ccd Observations ◽  
Resolution Analysis ◽  
Very High ◽  
Small Field Of View

AbstractWe present the results of the analysis of a movie taken over a small field of view in the intermediate corona at a spatial resolution of 0.5“, a temporal resolution of 1 s and a spectral passband of 7 nm. These CCD observations were made at the prime focus of the 3.6 m aperture CFHT telescope during the 1991 total solar eclipse.

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