2015 China Semiconductor Technology International Conference
Latest Publications

TOTAL DOCUMENTS

182

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By IEEE

9781479972418

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Synthesis of monolayer MoS2 with seed promoters by chemical vapor deposition at low temperature

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153399 ◽

2015 ◽

Author(s):

Gu Pinchao ◽

Zhang Kailiang ◽

Feng Yulin ◽

Wang Fang ◽

Miao Yinping ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor

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Study of fin CD controllability for FinFET manufacturing

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153428 ◽

2015 ◽

Author(s):

Hai Zhao ◽

Gang Mao ◽

Rex Yang

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Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153324 ◽

2015 ◽

Author(s):

Lin-Qing Zhang ◽

Hong-Fan Huang ◽

Xiao-Yong Liu ◽

Jin-Shan Shi ◽

Zhuo Liu ◽

...

Keyword(s):

Radio Frequency ◽

Device Simulation ◽

Two Dimensional ◽

Gan Hemt

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A study of self-aligned contact etch of NOR flash

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153388 ◽

2015 ◽

Author(s):

Erhu Zheng ◽

Yiying Zhang ◽

Haiyang Zhang

Keyword(s):

Nor Flash

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Study of the ADR rinse effect on special residual type defect

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153368 ◽

2015 ◽

Author(s):

Bin Xing ◽

Jing'an Hao ◽

Guogui Deng ◽

Qiang Wu

Keyword(s):

Type Defect

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Sub-resolution assist feature (SRAF) study for active area immersion lithography

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153356 ◽

2015 ◽

Author(s):

Deping Kong ◽

Manhua Shen ◽

Qiang Wu

Keyword(s):

Active Area ◽

Immersion Lithography

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Academic approach to new industry-relevant MEMS

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153479 ◽

2015 ◽

Author(s):

Shuji Tanaka

Keyword(s):

New Industry

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Influence of sputtering gas on resistivity of thin Ni silicide films

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153402 ◽

2015 ◽

Author(s):

H. Imamura ◽

K. Kakushima ◽

Y. Kataoka ◽

A. Nishiyama ◽

N. Sugii ◽

...

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The analysis and reduction of auto focus failure of advanced darkfiled inspection system

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153457 ◽

2015 ◽

Author(s):

Zengyi Yuan ◽

Qiliang Ni ◽

Hunglin Chen ◽

Yin Long

Keyword(s):

Inspection System ◽

Auto Focus

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Diagnosis driven approach for low yield analysis and identifying root causes for final compensation from wafer foundry

2015 China Semiconductor Technology International Conference ◽

10.1109/cstic.2015.7153468 ◽

2015 ◽

Author(s):

Samuel Ye ◽

Jian Wu ◽

Xiuquan Li ◽

Liyun Qin ◽

Kungang Wang ◽

...

Keyword(s):

Yield Analysis

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2015 China Semiconductor Technology International ConferenceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Synthesis of monolayer MoS2 with seed promoters by chemical vapor deposition at low temperature

Study of fin CD controllability for FinFET manufacturing

Two-dimensional device simulation for radio frequency performance of AlGaN/GaN HEMT

A study of self-aligned contact etch of NOR flash

Study of the ADR rinse effect on special residual type defect

Sub-resolution assist feature (SRAF) study for active area immersion lithography

Academic approach to new industry-relevant MEMS

Influence of sputtering gas on resistivity of thin Ni silicide films

The analysis and reduction of auto focus failure of advanced darkfiled inspection system

Diagnosis driven approach for low yield analysis and identifying root causes for final compensation from wafer foundry

2015 China Semiconductor Technology International Conference
Latest Publications