Reactive-ion etching of tungsten for high-resolution x-ray masks

Mapping Intimacies ◽

10.1117/12.175802 ◽

1994 ◽

Author(s):

Loretta M. Shirey ◽

Kelly W. Foster ◽

William P. Chu ◽

John Kosakowski ◽

Kee W. Rhee ◽

...

Keyword(s):

High Resolution ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray

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Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers

10.1117/12.453816 ◽

2002 ◽

Cited By ~ 1

Author(s):

Bor-Yuan Shew ◽

Ruey-Shing Huang ◽

Duan-Jen Wang ◽

Shen-Yaw Perng ◽

Chien-Kuang Kuan ◽

...

Keyword(s):

High Resolution ◽

High Efficiency ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

X Ray

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X-ray zone plates fabricated using electron beam lithography and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583242 ◽

1985 ◽

Vol 3 (1) ◽

pp. 265 ◽

Cited By ~ 6

Author(s):

H. Aritome

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Zone Plates

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Directional emission of plastic luminescent films using photonic crystals fabricated by soft-X-ray interference lithography and reactive ion etching

Scientific Reports ◽

10.1038/s41598-018-27593-w ◽

2018 ◽

Vol 8 (1) ◽

Cited By ~ 4

Author(s):

Qiang Wu ◽

Bo Liu ◽

Zhichao Zhu ◽

Mu Gu ◽

Hong Chen ◽

...

Keyword(s):

Photonic Crystals ◽

Reactive Ion Etching ◽

Interference Lithography ◽

Ion Etching ◽

X Ray ◽

Directional Emission ◽

Luminescent Films

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X-ray photoelectron spectroscopy analyses of silicon dioxide contact holes etched in a magnetically enhanced reactive ion etching reactor

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590008 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1051 ◽

Cited By ~ 16

Author(s):

P. Czuprynski

Keyword(s):

Silicon Dioxide ◽

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray

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Study of Reactive Ion Etching of the Si3 N 4 / GaAs Interface in CF 4 Plasmas by X‐Ray Photoelectron Spectroscopy and X‐Ray Photoelectron Diffraction

Journal of The Electrochemical Society ◽

10.1149/1.2097363 ◽

1989 ◽

Vol 136 (8) ◽

pp. 2361-2367 ◽

Cited By ~ 8

Author(s):

P. Alnot ◽

J. Olivier ◽

F. Wyczisk ◽

R. Joubard

Keyword(s):

Photoelectron Spectroscopy ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Photoelectron Diffraction

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High-resolution reactive ion etching and damage effects in the Si/GexSi1−x system

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586461 ◽

1993 ◽

Vol 11 (6) ◽

pp. 2224 ◽

Cited By ~ 6

Author(s):

R. Cheung

Keyword(s):

High Resolution ◽

Reactive Ion Etching ◽

Ion Etching

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Grinding and chemical mechanical polishing process for micropore x-ray optics fabricated with deep reactive ion etching

Applied Optics ◽

10.1364/ao.58.005240 ◽

2019 ◽

Vol 58 (19) ◽

pp. 5240 ◽

Cited By ~ 1

Author(s):

Aoto Fukushima ◽

Maiko Fujitani ◽

Kumi Ishikawa ◽

Masaki Numazawa ◽

Daiki Ishi ◽

...

Keyword(s):

Chemical Mechanical Polishing ◽

Reactive Ion Etching ◽

Mechanical Polishing ◽

Polishing Process ◽

Ion Etching ◽

Ray Optics ◽

Deep Reactive Ion Etching ◽

X Ray ◽

Chemical Mechanical Polishing Process

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High resolution patterning with Ag2S/As2S3 inorganic electron-beam resist and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.582755 ◽

1983 ◽

Vol 1 (4) ◽

pp. 1174 ◽

Cited By ~ 10

Author(s):

B. Singh

Keyword(s):

Electron Beam ◽

High Resolution ◽

Reactive Ion Etching ◽

Ion Etching

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Reactive ion etching of multilayer mirrors for X-ray projection lithography masks

Microelectronic Engineering ◽

10.1016/0167-9317(91)90094-t ◽

1991 ◽

Vol 13 (1-4) ◽

pp. 283-286 ◽

Cited By ~ 4

Author(s):

C.Khan Malek ◽

F.R. Ladan ◽

M. Carré ◽

R. Rivoira

Keyword(s):

Reactive Ion Etching ◽

Multilayer Mirrors ◽

Ion Etching ◽

X Ray ◽

Projection Lithography ◽

Ray Projection

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X‐ray photoelectron study of the reactive ion etching of SixGe1−x alloys in SF6 plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579913 ◽

1996 ◽

Vol 14 (1) ◽

pp. 156-164 ◽

Cited By ~ 19

Author(s):

M. C. Peignon ◽

Ch. Cardinaud ◽

G. Turban ◽

C. Charles ◽

R. W. Boswell

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

Photoelectron Study

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