X‐ray photoelectron study of the reactive ion etching of SixGe1−x alloys in SF6 plasmas

1996 ◽  
Vol 14 (1) ◽  
pp. 156-164 ◽  
Author(s):  
M. C. Peignon ◽  
Ch. Cardinaud ◽  
G. Turban ◽  
C. Charles ◽  
R. W. Boswell
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
X Ray ◽  
Photoelectron Study

Reactive ion etching of multilayer mirrors for X-ray projection lithography masks

1991 ◽  
Vol 13 (1-4) ◽  
pp. 283-286 ◽  
Author(s):  
C.Khan Malek ◽  
F.R. Ladan ◽  
M. Carré ◽  
R. Rivoira
Keyword(s):  
Reactive Ion Etching ◽  
Multilayer Mirrors ◽  
Ion Etching ◽  
X Ray ◽  
Projection Lithography ◽  
Ray Projection

Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers

2002 ◽  
Author(s):  
Bor-Yuan Shew ◽  
Ruey-Shing Huang ◽  
Duan-Jen Wang ◽  
Shen-Yaw Perng ◽  
Chien-Kuang Kuan ◽  
...  
Keyword(s):  
High Resolution ◽  
High Efficiency ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
X Ray

Magnetic field-assisted finishing for micropore X-ray focusing mirrors fabricated by deep reactive ion etching

CIRP Annals ◽  
2010 ◽  
Vol 59 (1) ◽  
pp. 351-354 ◽  
Author(s):  
H. Yamaguchi ◽  
R.E. Riveros ◽  
I. Mitsuishi ◽  
U. Takagi ◽  
Y. Ezoe ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
X Ray
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